Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

Vivek M. Prabhu, Bryan D. Vogt, Shuhui Kang, Ashwin Rao, Eric K. Lin, Sushil K. Satija

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

The spatial distribution of polymer photoresist and deuterium labeled base developer highlights a fraction of the line edge that swells but does not dissolve. This residual swelling fraction remains swollen during both the in situ aqueous hydroxide dissolution (development) and water rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. These new insights into the mechanism of lithographic feature formation were enabled by contrast variant neutron reflectivity methods with nanometer resolution.

Original languageEnglish (US)
Pages (from-to)2514-2520
Number of pages7
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25
Issue number6
DOIs
StatePublished - Dec 19 2007

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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