Direct write of resistive lines on SiC

T. Y. Plew, K. H. Leong, J. M. Redwing

Research output: Contribution to journalArticlepeer-review

Abstract

The effects of the fluence and irradiance on the ability to write controlled resistance, conductive tracks using nanosecond laser pulses were studied. Two spot sizes and a large range of fluences were used to determine the optimal parameters to achieve controlled resistance. The resistance of the lines was determined using a digital ohmmeter. Optical micrographs were used to obtain the linewidths of the laser-written tracks, while profilometer scans and SEM were used to determine the ablation depths.

Original languageEnglish (US)
Pages (from-to)43-48
Number of pages6
JournalJournal of Laser Applications
Volume15
Issue number1
DOIs
StatePublished - Feb 2003

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Biomedical Engineering
  • Instrumentation

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