TY - JOUR
T1 - Dislocation driven spiral and non-spiral growth in layered chalcogenides
AU - Nie, Yifan
AU - Barton, Adam T.
AU - Addou, Rafik
AU - Zheng, Yongping
AU - Walsh, Lee A.
AU - Eichfeld, Sarah M.
AU - Yue, Ruoyu
AU - Cormier, Christopher R.
AU - Zhang, Chenxi
AU - Wang, Qingxiao
AU - Liang, Chaoping
AU - Robinson, Joshua A.
AU - Kim, Moon
AU - Vandenberghe, William
AU - Colombo, Luigi
AU - Cha, Pil Ryung
AU - Wallace, Robert M.
AU - Hinkle, Christopher L.
AU - Cho, Kyeongjae
N1 - Funding Information:
PRC appreciates the financial support by Leading Foreign Research Institute Recruitment Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT & Future Planning (MSIP) (2013K1A4A3055679).
Funding Information:
This work was supported by the Center for Low Energy Systems Technology (LEAST), one of six centers supported by the STARnet phase of the Focus Center Research Program (FCRP), a Semiconductor Research Corporation Program sponsored by MARCO and DARPA.
Publisher Copyright:
© The Royal Society of Chemistry.
PY - 2018/8/21
Y1 - 2018/8/21
N2 - Two-dimensional materials have shown great promise for implementation in next-generation devices. However, controlling the film thickness during epitaxial growth remains elusive and must be fully understood before wide scale industrial application. Currently, uncontrolled multilayer growth is frequently observed, and not only does this growth mode contradict theoretical expectations, but it also breaks the inversion symmetry of the bulk crystal. In this work, a multiscale theoretical investigation aided by experimental evidence is carried out to identify the mechanism of such an unconventional, yet widely observed multilayer growth in the epitaxy of layered materials. This work reveals the subtle mechanistic similarities between multilayer concentric growth and spiral growth. Using the combination of experimental demonstration and simulations, this work presents an extended analysis of the driving forces behind this non-ideal growth mode, and the conditions that promote the formation of these defects. Our study shows that multilayer growth can be a result of both chalcogen deficiency and chalcogen excess: the former causes metal clustering as nucleation defects, and the latter generates in-domain step edges facilitating multilayer growth. Based on this fundamental understanding, our findings provide guidelines for the narrow window of growth conditions which enables large-area, layer-by-layer growth.
AB - Two-dimensional materials have shown great promise for implementation in next-generation devices. However, controlling the film thickness during epitaxial growth remains elusive and must be fully understood before wide scale industrial application. Currently, uncontrolled multilayer growth is frequently observed, and not only does this growth mode contradict theoretical expectations, but it also breaks the inversion symmetry of the bulk crystal. In this work, a multiscale theoretical investigation aided by experimental evidence is carried out to identify the mechanism of such an unconventional, yet widely observed multilayer growth in the epitaxy of layered materials. This work reveals the subtle mechanistic similarities between multilayer concentric growth and spiral growth. Using the combination of experimental demonstration and simulations, this work presents an extended analysis of the driving forces behind this non-ideal growth mode, and the conditions that promote the formation of these defects. Our study shows that multilayer growth can be a result of both chalcogen deficiency and chalcogen excess: the former causes metal clustering as nucleation defects, and the latter generates in-domain step edges facilitating multilayer growth. Based on this fundamental understanding, our findings provide guidelines for the narrow window of growth conditions which enables large-area, layer-by-layer growth.
UR - http://www.scopus.com/inward/record.url?scp=85051517534&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85051517534&partnerID=8YFLogxK
U2 - 10.1039/c8nr02280a
DO - 10.1039/c8nr02280a
M3 - Article
C2 - 30052245
AN - SCOPUS:85051517534
SN - 2040-3364
VL - 10
SP - 15023
EP - 15034
JO - Nanoscale
JF - Nanoscale
IS - 31
ER -