Dissolution fundamentals of 193-nm methacrylate based photoresists

Ashwin Rao, Shuhui Kang, Bryan Vogt, Vivek M. Prabhu, Eric K. Lin, Wen Li Wu, Karen Turnquest, William D. Hinsberg

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

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Chemical Compounds

Mathematics

Physics & Astronomy

Engineering & Materials Science