Effect of electrical boundary conditions on ferroelectric domain structures in thin films

Y. L. Li, S. Y. Hu, Z. K. Liu, L. Q. Chen

Research output: Contribution to journalArticle

155 Citations (Scopus)

Abstract

The domain structures in a ferroelectric thin film are studied using a phase-field model. A cubic-to-tetragonal ferroelectric phase transition in lead titanate thin film is considered. Both elastic interactions and electrostatic interactions are taken into account. The focus is on the effect of electrical boundary conditions on the domain morphologies and volume fractions. It is shown that different electric boundary conditions may have a significant effect on the domain structures.

Original languageEnglish (US)
Pages (from-to)427-429
Number of pages3
JournalApplied Physics Letters
Volume81
Issue number3
DOIs
StatePublished - Jul 15 2002

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boundary conditions
thin films
interactions
electrostatics

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

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Effect of electrical boundary conditions on ferroelectric domain structures in thin films. / Li, Y. L.; Hu, S. Y.; Liu, Z. K.; Chen, L. Q.

In: Applied Physics Letters, Vol. 81, No. 3, 15.07.2002, p. 427-429.

Research output: Contribution to journalArticle

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