Effect of low-pressure argon plasma on metal vaporization rates

P. Sahoo, T. Debroy

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Rates of vaporization of liquid iron and copper drops were determined both in the presence and the absence of a low-pressure argon plasma. The vaporization rates of pure metal drops and metal drops that were doped with small amounts of oxygen or sulfur were found to decrease when plasma was present. The results are consistent with the presence of a charge distribution field in close proximity of the interface.

Original languageEnglish (US)
Pages (from-to)406-408
Number of pages3
JournalMaterials Letters
Volume6
Issue number11-12
DOIs
StatePublished - Jul 1988

Fingerprint

Argon
argon plasma
Vaporization
low pressure
Metals
Plasmas
metals
Charge distribution
Sulfur
charge distribution
proximity
Copper
sulfur
Iron
Oxygen
iron
copper
Liquids
oxygen
liquids

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

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abstract = "Rates of vaporization of liquid iron and copper drops were determined both in the presence and the absence of a low-pressure argon plasma. The vaporization rates of pure metal drops and metal drops that were doped with small amounts of oxygen or sulfur were found to decrease when plasma was present. The results are consistent with the presence of a charge distribution field in close proximity of the interface.",
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Effect of low-pressure argon plasma on metal vaporization rates. / Sahoo, P.; Debroy, T.

In: Materials Letters, Vol. 6, No. 11-12, 07.1988, p. 406-408.

Research output: Contribution to journalArticle

TY - JOUR

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AU - Debroy, T.

PY - 1988/7

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AB - Rates of vaporization of liquid iron and copper drops were determined both in the presence and the absence of a low-pressure argon plasma. The vaporization rates of pure metal drops and metal drops that were doped with small amounts of oxygen or sulfur were found to decrease when plasma was present. The results are consistent with the presence of a charge distribution field in close proximity of the interface.

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