Effect of polarity on Ni/InN interfacial reactions

K. C. Kragh-Buetow, X. Weng, E. D. Readinger, M. Wraback, S. E. Mohney

Research output: Contribution to journalArticlepeer-review


Ni films on (0001) and (000 1 ̄) InN exhibited different reaction kinetics upon annealing at 673K. Structural and chemical analysis using grazing incidence X-ray diffraction, transmission electron microscopy, and X-ray energy dispersive spectrometry indicated that an interfacial reaction did not occur between the Ni film and the In-polar (0001) InN layer. However, the N-polar face reacted with Ni to form the Ni3InNx ternary phase with an anti-perovskite structure. The difference in reactivity for Ni on In-face and N-face InN indicates that polarity alters the reaction and may also affect interactions between other metals and group III-nitride semiconductors.

Original languageEnglish (US)
Article number021607
JournalApplied Physics Letters
Issue number2
StatePublished - Jan 14 2013

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


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