Effect of silicon surface condition on film formation using mist deposition

K. Shanmugasundaram, K. Chang, Jerzy Ruzyllo

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

Mist deposition is a novel method of depositing thin films of liquid precursors. The surface condition of silicon and SiO 2 substrates determines the wetting properties of liquid precursors used in mist deposition. This property has been utilized in this study to selectively deposit various liquid precursors on SiO 2 substrates. The effect of geometry of structures was also investigated. It is demonstrated that under the proper surface conditions films of selected dielectrics can be selectively deposited.

Original languageEnglish (US)
Pages (from-to)105-110
Number of pages6
JournalECS Transactions
Volume1
Issue number3
StatePublished - Dec 1 2005
Event9th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing - 2005 Fall Meeting of the Electrochemical Society - Los Angeles, CA, United States
Duration: Oct 16 2005Oct 21 2005

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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