Effect of silicon surface condition on film formation using mist deposition

K. Shanmugasundaram, K. Chang, Jerzy Ruzyllo

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Mist deposition is a novel method of depositing thin films of liquid precursors. The surface condition of silicon and SiO 2 substrates determines the wetting properties of liquid precursors used in mist deposition. This property has been utilized in this study to selectively deposit various liquid precursors on SiO 2 substrates. The effect of geometry of structures was also investigated. It is demonstrated that under the proper surface conditions films of selected dielectrics can be selectively deposited.

Original languageEnglish (US)
Pages (from-to)105-110
Number of pages6
JournalECS Transactions
Volume1
Issue number3
StatePublished - 2005

Fingerprint

Fog
Silicon
Liquids
Substrates
Wetting
Deposits
Thin films
Geometry

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Shanmugasundaram, K. ; Chang, K. ; Ruzyllo, Jerzy. / Effect of silicon surface condition on film formation using mist deposition. In: ECS Transactions. 2005 ; Vol. 1, No. 3. pp. 105-110.
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Effect of silicon surface condition on film formation using mist deposition. / Shanmugasundaram, K.; Chang, K.; Ruzyllo, Jerzy.

In: ECS Transactions, Vol. 1, No. 3, 2005, p. 105-110.

Research output: Contribution to journalArticle

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