Mist deposition is a novel method of depositing thin films of liquid precursors. The surface condition of silicon and SiO 2 substrates determines the wetting properties of liquid precursors used in mist deposition. This property has been utilized in this study to selectively deposit various liquid precursors on SiO 2 substrates. The effect of geometry of structures was also investigated. It is demonstrated that under the proper surface conditions films of selected dielectrics can be selectively deposited.
|Original language||English (US)|
|Number of pages||6|
|State||Published - Dec 1 2005|
|Event||9th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing - 2005 Fall Meeting of the Electrochemical Society - Los Angeles, CA, United States|
Duration: Oct 16 2005 → Oct 21 2005
All Science Journal Classification (ASJC) codes