Effect of the H2O/TEOS ratio upon the preparation and nitridation of silica sol/gel films

P. M. Glaser, C. G. Pantano

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40 Scopus citations

Abstract

Silica sol/gel thin films were deposited on silicon wafers by spinning solutions of varying H2O/TEOS ratio. It was found that the density of the initial microporous dried gel film increases with the H2O/TEOS ratio. Consequently, the amount of film shrinkage observed during thermal treatment in N2 or NH3 was decreased with increasing H2O/TEOS. This is contrary to the behavior of bulk gels derived from solutions of increasing H2O/TEOS ratio. Most significant, though, was the enhanced incorporation of nitrogen during ammonia treatment of the films prepared with solutions of increasing H2O/TEOS ratio. Moreover, there was some indication that the nitrided films obtained after the ammonia treatment may limit oxidation of the silicon wafer.

Original languageEnglish (US)
Pages (from-to)209-221
Number of pages13
JournalJournal of Non-Crystalline Solids
Volume63
Issue number1-2
DOIs
StatePublished - Feb 1984

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

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