Effects of adsorbed water layer structure on adhesion force of silicon oxide nanoasperity contact in humid ambiance

Seong Kim, David B. Asay

Research output: Contribution to conferencePaperpeer-review

Abstract

As relative humidity (RH) increases, the adhesion force of the single asperity contact between silicon oxide surfaces increases in the low RH region, reaches a maximum in intermediate RH, and then decreases in the high RH region. This behavior has been traditionally attributed to the capillary force caused by liquid water condensation in the nanoasperity contact region. However, the capillary force alone cannot explain the exact trend and magnitude of the RH dependence of the adhesion force. We found that the origin of the large RH dependence is the presence of ice-like structure at the first 3 layers of adsorbed water and the viscoelastic behavior of the adsorbed water layer. A theoretical model taking into account these factors is developed, which accurately describes the shape of the adhesion force curve as a function of humidity as well as its magnitude.

Original languageEnglish (US)
Number of pages1
StatePublished - Dec 1 2005
Event05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States
Duration: Oct 30 2005Nov 4 2005

Other

Other05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
CountryUnited States
CityCincinnati, OH
Period10/30/0511/4/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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