Effects of postanneal conditions on the dielectric properties of CaCu 3Ti 4O 12 thin films prepared on Pt/Ti/SiO 2/Si substrates

Liang Fang, Mingrong Shen, Wenwu Cao

Research output: Contribution to journalArticle

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Abstract

The effects of postanneal conditions on the dielectric properties of high-dielectric-constant CaCu 3Ti 4O 2 (CCTO) thin films were investigated. The films were synthesized on Pt/Ti/SiO 2 substrates using pulsed-laser deposition (PLD) method. It was observed that the postannealing in nitrogen atmosphere had produced low-frequency high dielectric relaxation with increasing annealing temperature. It was also observed that annealing in oxygen atmosphere at high temperature had suppressed the relaxation and decreased the dielectric constant of the films.

Original languageEnglish (US)
Pages (from-to)6483-6485
Number of pages3
JournalJournal of Applied Physics
Volume95
Issue number11 I
DOIs
StatePublished - Jun 1 2004

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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