Effects of radiation on newly synthesized allylamino-substituted polyphosphazenes

M. F. Welker, H. R. Allcock, G. L. Grune, R. T. Chern, V. T. Stanett

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Scopus citations

Abstract

A collaborative effort to synthesize amino-substituted polyphosphazenes and characterize their sensitivity to radiation to determine the value of using such polymers as new and better resist materials for microlithographic applications is progressing. There is some evidence to support the theory that these polymers will exhibit the same RIE resistance as a phenoxy-substituted counterpart. The models of the earlier study led us to the realization that the addition of allylic substituents may enhance the radiation sensitivity of such polymers significantly. Such was the case for several of the polymers recently synthesized, characterized and irradiated.

Original languageEnglish (US)
Title of host publicationPolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
PublisherPubl by ACS
Pages259-260
Number of pages2
ISBN (Print)0841222169
StatePublished - Dec 1 1992

Publication series

NamePolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
Volume66
ISSN (Print)0743-0515

All Science Journal Classification (ASJC) codes

  • Chemical Engineering (miscellaneous)
  • Polymers and Plastics

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