Electrical and magnetic properties of Ga1-xGdxN grown by metal organic chemical vapor deposition

Shalini Gupta, Tahir Zaidi, Andrew Melton, Enno Malguth, Hongbo Yu, Zhiqiang Liu, Xiaotao Liu, Justin Schwartz, Ian T. Ferguson

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Abstract

This paper presents the first report on Gd doping (0-4) of GaN thin films by metal organic chemical vapor deposition. The Ga1-xGdxN films grown in this study were found to be of good crystalline quality, single-phase, and unstrained, with a high saturation magnetization strength of 20 emu/cm3+ being obtained for GaN films doped with 2 Gd at room temperature. Furthermore, these films were found to be conductive with an enhanced n-type behavior suggesting that unintentional donors are responsible for stabilizing the ferromagnetic phase in as-grown Ga1-xGd xN. Additionally, it was found that this magnetization can be enhanced by n-(Si: 1018cm-3) and p-(Mg: 10 19cm-3) doping to 110 emu/cm3+ and ∼500 emu/cm3+, respectively. This paper shows empirically that holes are more efficient in stabilizing the ferromagnetic phase as compared to electrons. Overall, this research has resulted in a room temperature ferromagnetic dilute magnetic semiconductor that is conductive and whose magnetic properties can be tuned by carrier doping thus providing a path towards realizing spintronic devices.

Original languageEnglish (US)
Article number083920
JournalJournal of Applied Physics
Volume110
Issue number8
DOIs
Publication statusPublished - Oct 15 2011

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Gupta, S., Zaidi, T., Melton, A., Malguth, E., Yu, H., Liu, Z., ... Ferguson, I. T. (2011). Electrical and magnetic properties of Ga1-xGdxN grown by metal organic chemical vapor deposition. Journal of Applied Physics, 110(8), [083920]. https://doi.org/10.1063/1.3656019