Electrical Characterization of the Si Substrate in Magnetically Enhanced or Conventional Reactive-Ion-Etch-Exposed SiO2/p-Si Structures

Osama O. Awadelkarim, T. Gu, R. A. Ditizio, P. I. Mikulan, S. J. Fonash, J. F. Rembetski, Y. D. Chan

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