Electrically reversible cracks in an intermetallic film controlled by an electric field

Z. Q. Liu, J. H. Liu, M. D. Biegalski, J. M. Hu, S. L. Shang, Y. Ji, J. M. Wang, S. L. Hsu, A. T. Wong, M. J. Cordill, B. Gludovatz, C. Marker, H. Yan, Z. X. Feng, L. You, M. W. Lin, T. Z. Ward, Z. K. Liu, C. B. Jiang, L. Q. ChenR. O. Ritchie, H. M. Christen, R. Ramesh

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