Electrodeposition of metallic nanowire thin films using mesoporous silica templates

Donghai Wang, Weilie L. Zhou, Byron F. McCaughy, J. Eric Hampsey, Xianglin Ji, Ying Bing Jiang, Huifang Xu, Jinke Tang, Russell H. Schmehl, Charles O'Connor, C. Jeffrey Brinker, Yunfeng Lu

Research output: Contribution to journalArticlepeer-review

122 Scopus citations

Abstract

The fabrication of metal thin films composed of ordered arrays of metal nanowires that were grown electrochemically within silica mesoporous channels was discussed. Nanowires were continually grown from the bottom until the mesoporous channels were filled. Electrodeposited metal nanowires were characterized by transmission electron microscopy (TEM), electron energy loss spectroscopy (EELS) and scanning electron microscopy (SEM).

Original languageEnglish (US)
Pages (from-to)130-133
Number of pages4
JournalAdvanced Materials
Volume15
Issue number2
DOIs
StatePublished - Jan 16 2003

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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