Electron paramagnetic resonance studies of interlayer dielectrics

B. C. Bittel, T. A. Pomorski, P. M. Lenahan, S. King, E. Mays

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

Interlayer dielectrics with low dielectric constants are needed for current and future ULSI technology nodes. [1,2] However an understanding of the defects which limit reliability and cause increased leakage currents is not yet developed for these low-k films. As reported previously [3], we have observed several performance limiting defects with electron paramagnetic resonance (EPR) that correlate quite strongly to leakage current measurements. We have recently made significant progress in developing a fundamental understanding of how film composition and processing parameters affect specific defects and how these defects are related to leakage currents. In this new work we utilize EPR and leakage current measurements to investigate over fifty low-k dielectrics with potential use as ILDs and ESLs. Films investigated include various compositions of SiOC, SiO2, SiN, SiCN, and SiC deposited deposition on 300 mm (100) silicon wafers. They exhibit a wide range of dielectric constant, sample chemistry, and density.

Original languageEnglish (US)
Title of host publication2011 IEEE International Integrated Reliability Workshop Final Report, IRW 2011
Pages50-54
Number of pages5
DOIs
StatePublished - Dec 1 2011
Event2011 30th IEEE International Integrated Reliability Workshop Final Report, IRW 2011 - South Lake Tahoe, CA, United States
Duration: Oct 16 2011Oct 20 2011

Publication series

NameIEEE International Integrated Reliability Workshop Final Report

Other

Other2011 30th IEEE International Integrated Reliability Workshop Final Report, IRW 2011
CountryUnited States
CitySouth Lake Tahoe, CA
Period10/16/1110/20/11

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All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Safety, Risk, Reliability and Quality
  • Electronic, Optical and Magnetic Materials

Cite this

Bittel, B. C., Pomorski, T. A., Lenahan, P. M., King, S., & Mays, E. (2011). Electron paramagnetic resonance studies of interlayer dielectrics. In 2011 IEEE International Integrated Reliability Workshop Final Report, IRW 2011 (pp. 50-54). [6142587] (IEEE International Integrated Reliability Workshop Final Report). https://doi.org/10.1109/IIRW.2011.6142587