Electrostatically doped WSe2 CMOS inverter

Saptarshi Das, Andreas Roelofs

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Citations (Scopus)

Abstract

In this article we report a fully complementary CMOS inverter using multi-layer WSe2 as the channel material in dual gated transistor geometry. We have employed electrostatic doping and contact work function engineering in order to experimentally demonstrate the logic inverter. The maximum inverter gain was found to be ∼12. The noise margin (NM) was ∼ 2.0V. Semiconducting transition metal dichalcogenides (TMDs) like MoS 2, MoSe2, WSe2 and many others are being investigated as potential candidates for beyond Si nanoelectronics owing to their ultra-thin body that allow aggressive channel length scaling (1-4). In this context, it is important to demonstrate simple logic circuits like the inverter with these novel 2D crystals in order to justify their true potential. An inverter should ideally comprise of a PFET and an NFET with similar drive current capabilities. This requires that the channel material should provide easy access to both the electron in the conduction band and holes in the valence band. In Si CMOS this feature is easily achieved through substitutional doping. However, in case of the TMDs, due to the absence of a controllable and sustainable doping scheme, one has to rely on electrostatic doping (adjustment of threshold voltage through gating) and the position of contact Fermi level determined by the work function of the contact metal to enable electron or hole conduction.

Original languageEnglish (US)
Title of host publication72nd Device Research Conference, DRC 2014 - Conference Digest
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages185-186
Number of pages2
ISBN (Print)9781479954056
DOIs
StatePublished - Jan 1 2014
Event72nd Device Research Conference, DRC 2014 - Santa Barbara, CA, United States
Duration: Jun 22 2014Jun 25 2014

Publication series

NameDevice Research Conference - Conference Digest, DRC
ISSN (Print)1548-3770

Other

Other72nd Device Research Conference, DRC 2014
CountryUnited States
CitySanta Barbara, CA
Period6/22/146/25/14

Fingerprint

Doping (additives)
Transition metals
Electrostatics
Nanoelectronics
Electrons
Logic circuits
Valence bands
Fermi level
Conduction bands
Threshold voltage
Transistors
Crystals
Geometry
Metals

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Cite this

Das, S., & Roelofs, A. (2014). Electrostatically doped WSe2 CMOS inverter. In 72nd Device Research Conference, DRC 2014 - Conference Digest (pp. 185-186). [6872359] (Device Research Conference - Conference Digest, DRC). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/DRC.2014.6872359
Das, Saptarshi ; Roelofs, Andreas. / Electrostatically doped WSe2 CMOS inverter. 72nd Device Research Conference, DRC 2014 - Conference Digest. Institute of Electrical and Electronics Engineers Inc., 2014. pp. 185-186 (Device Research Conference - Conference Digest, DRC).
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Das, S & Roelofs, A 2014, Electrostatically doped WSe2 CMOS inverter. in 72nd Device Research Conference, DRC 2014 - Conference Digest., 6872359, Device Research Conference - Conference Digest, DRC, Institute of Electrical and Electronics Engineers Inc., pp. 185-186, 72nd Device Research Conference, DRC 2014, Santa Barbara, CA, United States, 6/22/14. https://doi.org/10.1109/DRC.2014.6872359

Electrostatically doped WSe2 CMOS inverter. / Das, Saptarshi; Roelofs, Andreas.

72nd Device Research Conference, DRC 2014 - Conference Digest. Institute of Electrical and Electronics Engineers Inc., 2014. p. 185-186 6872359 (Device Research Conference - Conference Digest, DRC).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Das S, Roelofs A. Electrostatically doped WSe2 CMOS inverter. In 72nd Device Research Conference, DRC 2014 - Conference Digest. Institute of Electrical and Electronics Engineers Inc. 2014. p. 185-186. 6872359. (Device Research Conference - Conference Digest, DRC). https://doi.org/10.1109/DRC.2014.6872359