The combination of stopped-flow techniques and reduction photolithography is described to engineer a modular platform for sequential photochemical reactions in a continuous manner. This facilitates chemical surface patterning through successive exchange of reactants within a stop-flow cell, while providing significant flexibility to exchange light sources, and spatially decoupled photomasks. Spatially controlled photopolymerization, followed by exchange of the solution within the stop-flow cell, and secondary functionalization of polymer brushes by light-mediated removal of the active terminal bromine chain end are observed during the investigations.
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering