Engineering Surfaces through Sequential Stop-Flow Photopatterning

Christian Pester, Benjaporn Narupai, Kaila M. Mattson, David P. Bothman, Daniel Klinger, Kenneth W. Lee, Emre H. Discekici, Craig J. Hawker

Research output: Contribution to journalArticlepeer-review

47 Scopus citations

Abstract

The combination of stopped-flow techniques and reduction photolithography is described to engineer a modular platform for sequential photochemical reactions in a continuous manner. This facilitates chemical surface patterning through successive exchange of reactants within a stop-flow cell, while providing significant flexibility to exchange light sources, and spatially decoupled photomasks. Spatially controlled photopolymerization, followed by exchange of the solution within the stop-flow cell, and secondary functionalization of polymer brushes by light-mediated removal of the active terminal bromine chain end are observed during the investigations.

Original languageEnglish (US)
Pages (from-to)9292-9300
Number of pages9
JournalAdvanced Materials
Volume28
Issue number42
DOIs
StatePublished - Jan 1 2016

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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