Engineering the phase speed of surface-plasmon wave at the planar interface of a metal and a chiral sculptured thin film

Akhlesh Lakhtakia, John A. Polo

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

The solution of a boundary-value problem formulated for a modified Kretschmann configuration shows that the phase speed of a surface-plasmon wave guided by the planar interface of a sufficiently thin metal film and a chiral sculptured thin film (STF) depends on the vapor incidence angle used while fabricating the chiral STF by physical vapor deposition. Therefore, it may be possible to engineer the phase speed quite simply by selecting an appropriate value of the vapor deposition angle (in addition to the metal and the evaporant species).

Original languageEnglish (US)
Pages (from-to)1966-1970
Number of pages5
JournalMicrowave and Optical Technology Letters
Volume50
Issue number7
DOIs
StatePublished - Jul 1 2008

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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