Enhanced barrier performance of SiOx-modified polymer substrates

Some morphological considerations

Bo Chy Wang, Y. Tropsha, D. B. Montgomery, Erwin A. Vogler, R. J. Spontak

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

The morphological features of thin SiOx films deposited on polystyrene and polycarbonate substrates were studied using atomic force microscopy and transmission electron microscopy. Preliminary evidence for additional morphology/permeability relationships was provided. The permeance of SiOx-coated polymers depended strongly on both the film roughness and thickness, decreasing with a reduction in roughness or an increase in thickness. To a lesser extent, the barrier performance also depended on the deposition power level, suggesting that an optimal power level may exist.

Original languageEnglish (US)
Pages (from-to)311-315
Number of pages5
JournalJournal of Materials Science Letters
Volume18
Issue number4
DOIs
StatePublished - Jan 1 1999

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polycarbonate
Polymers
Surface roughness
Polystyrenes
Substrates
Polycarbonates
Atomic force microscopy
Transmission electron microscopy
Thin films

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

Wang, Bo Chy ; Tropsha, Y. ; Montgomery, D. B. ; Vogler, Erwin A. ; Spontak, R. J. / Enhanced barrier performance of SiOx-modified polymer substrates : Some morphological considerations. In: Journal of Materials Science Letters. 1999 ; Vol. 18, No. 4. pp. 311-315.
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Enhanced barrier performance of SiOx-modified polymer substrates : Some morphological considerations. / Wang, Bo Chy; Tropsha, Y.; Montgomery, D. B.; Vogler, Erwin A.; Spontak, R. J.

In: Journal of Materials Science Letters, Vol. 18, No. 4, 01.01.1999, p. 311-315.

Research output: Contribution to journalArticle

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