Epitaxial graphene materials integration: Effects of dielectric overlayers on structural and electronic properties

Joshua Alexander Robinson, Michael Labella, Kathleen A. Trumbull, Xiaojun Weng, Randall Cavelero, Tad Daniels, Zachary Hughes, Mathew Hollander, Mark Andrew Fanton, David W. Snyder

Research output: Contribution to journalArticlepeer-review

101 Scopus citations

Abstract

We present the integration of epitaxial graphene with thin film dielectric materials for the purpose of graphene transistor development. The impact on epitaxial graphene structural and electronic properties following deposition of Al2O3, HfO2, TiO2, and Ta 2O5 varies based on the choice of dielectric and deposition parameters. Each dielectric film requires the use of a nucleation layer to ensure uniform, continuous coverage on the graphene surface. Graphene quality degrades most severely following deposition of Ta2O 5, while the deposition if TiO2 appears to improve the graphene carrier mobility. Finally, we discuss the potential of dielectric stack engineering for improved transistor performance.

Original languageEnglish (US)
Pages (from-to)2667-2672
Number of pages6
JournalACS Nano
Volume4
Issue number5
DOIs
StatePublished - May 25 2010

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

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