Epitaxial growth of few-layer β-In2Se3 thin films by metalorganic chemical vapor deposition

Xiaotian Zhang, Sora Lee, Anushka Bansal, Fu Zhang, Mauricio Terrones, Thomas N. Jackson, Joan M. Redwing

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Recent interest in the family of layered indium selenides has grown rapidly due to their intriguing properties such as photoresponsivity and ferroelectricity. However, practical applications require uniform crystalline films over large area. Here we report epitaxial growth of layered β-In2Se3 thin films by metalorganic chemical vapor deposition (MOCVD) using trimethyl indium (TMIn) and H2Se in a hydrogen ambient. Epitaxy has been realized on both c-plane sapphire and Si (1 1 1) while different growth modes were observed on these two substrates. Few-layer β-In2Se3 films have been successfully achieved by precursor pulsing to minimize gas phase pre-reactions. Finally, top gate β-In2Se3 thin film transistors with field effect mobility near 1 cm2/V·s have been demonstrated. This work offers a scalable production of high-quality β-In2Se3 films and potential integration with 3D fabrication and flexible electronics under low processing temperature.

Original languageEnglish (US)
Article number125471
JournalJournal of Crystal Growth
Volume533
DOIs
StatePublished - Mar 1 2020

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Epitaxial growth of few-layer β-In<sub>2</sub>Se<sub>3</sub> thin films by metalorganic chemical vapor deposition'. Together they form a unique fingerprint.

Cite this