Epitaxial YBa2Cu3O7-y bolometers on micromachined windows in silicon wafers

Q. Li, D. B. Fenner, W. D. Hamblen, D. G. Hamblen

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34 Scopus citations

Abstract

Epitaxial YBCO thin-film bolometers have been successfully fabricated on thin Si(100) substrates. Substrates included prethinned wafers ranging from 400 μm down to 4 μm thick, and a window, 0.75 μm thick, micromachined into a 400-μm wafer. As the Si is made thinner, the speed and responsivity both improve considerably. A 500-μs rise time was achieved on the micromachined window bolometer (0.75-μm-thick Si) under chopped infrared illumination. Calculations of heat flow in Si windows are in excellent agreement with the observed window-bolometer response waveform.

Original languageEnglish (US)
Pages (from-to)2428-2430
Number of pages3
JournalApplied Physics Letters
Volume62
Issue number19
DOIs
StatePublished - 1993

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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