Epitaxial YBa2Cu3O7-y bolometers on micromachined windows in silicon wafers

Qi Li, D. B. Fenner, W. D. Hamblen, D. G. Hamblen

Research output: Contribution to journalArticle

31 Citations (Scopus)

Abstract

Epitaxial YBCO thin-film bolometers have been successfully fabricated on thin Si(100) substrates. Substrates included prethinned wafers ranging from 400 μm down to 4 μm thick, and a window, 0.75 μm thick, micromachined into a 400-μm wafer. As the Si is made thinner, the speed and responsivity both improve considerably. A 500-μs rise time was achieved on the micromachined window bolometer (0.75-μm-thick Si) under chopped infrared illumination. Calculations of heat flow in Si windows are in excellent agreement with the observed window-bolometer response waveform.

Original languageEnglish (US)
Pages (from-to)2428-2430
Number of pages3
JournalApplied Physics Letters
Volume62
Issue number19
DOIs
StatePublished - Dec 1 1993

Fingerprint

bolometers
wafers
silicon
heat transmission
waveforms
illumination
thin films

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Li, Qi ; Fenner, D. B. ; Hamblen, W. D. ; Hamblen, D. G. / Epitaxial YBa2Cu3O7-y bolometers on micromachined windows in silicon wafers. In: Applied Physics Letters. 1993 ; Vol. 62, No. 19. pp. 2428-2430.
@article{e55f0aaac0a74f9bb6817e031e2f2d6c,
title = "Epitaxial YBa2Cu3O7-y bolometers on micromachined windows in silicon wafers",
abstract = "Epitaxial YBCO thin-film bolometers have been successfully fabricated on thin Si(100) substrates. Substrates included prethinned wafers ranging from 400 μm down to 4 μm thick, and a window, 0.75 μm thick, micromachined into a 400-μm wafer. As the Si is made thinner, the speed and responsivity both improve considerably. A 500-μs rise time was achieved on the micromachined window bolometer (0.75-μm-thick Si) under chopped infrared illumination. Calculations of heat flow in Si windows are in excellent agreement with the observed window-bolometer response waveform.",
author = "Qi Li and Fenner, {D. B.} and Hamblen, {W. D.} and Hamblen, {D. G.}",
year = "1993",
month = "12",
day = "1",
doi = "10.1063/1.109386",
language = "English (US)",
volume = "62",
pages = "2428--2430",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "19",

}

Epitaxial YBa2Cu3O7-y bolometers on micromachined windows in silicon wafers. / Li, Qi; Fenner, D. B.; Hamblen, W. D.; Hamblen, D. G.

In: Applied Physics Letters, Vol. 62, No. 19, 01.12.1993, p. 2428-2430.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Epitaxial YBa2Cu3O7-y bolometers on micromachined windows in silicon wafers

AU - Li, Qi

AU - Fenner, D. B.

AU - Hamblen, W. D.

AU - Hamblen, D. G.

PY - 1993/12/1

Y1 - 1993/12/1

N2 - Epitaxial YBCO thin-film bolometers have been successfully fabricated on thin Si(100) substrates. Substrates included prethinned wafers ranging from 400 μm down to 4 μm thick, and a window, 0.75 μm thick, micromachined into a 400-μm wafer. As the Si is made thinner, the speed and responsivity both improve considerably. A 500-μs rise time was achieved on the micromachined window bolometer (0.75-μm-thick Si) under chopped infrared illumination. Calculations of heat flow in Si windows are in excellent agreement with the observed window-bolometer response waveform.

AB - Epitaxial YBCO thin-film bolometers have been successfully fabricated on thin Si(100) substrates. Substrates included prethinned wafers ranging from 400 μm down to 4 μm thick, and a window, 0.75 μm thick, micromachined into a 400-μm wafer. As the Si is made thinner, the speed and responsivity both improve considerably. A 500-μs rise time was achieved on the micromachined window bolometer (0.75-μm-thick Si) under chopped infrared illumination. Calculations of heat flow in Si windows are in excellent agreement with the observed window-bolometer response waveform.

UR - http://www.scopus.com/inward/record.url?scp=36449003643&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=36449003643&partnerID=8YFLogxK

U2 - 10.1063/1.109386

DO - 10.1063/1.109386

M3 - Article

AN - SCOPUS:36449003643

VL - 62

SP - 2428

EP - 2430

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 19

ER -