Erosion and degradation of EUV lithography collector mirrors under particle bombardment

Jean Paul Allain, Ahmed Hassanein, Martin Nieto, Vladimir Titov, Perry Plotkin, Edward Hinson, Bryan J. Rice, R. Bristol, Daniel Rokusek, Wayne Lytle, Brent J. Heuser, Monica M.C. Allain, Hyunsu Ju, Christopher Chrobak

Research output: Contribution to journalConference article

13 Citations (Scopus)

Abstract

In extreme ultraviolet lithography (EUVL) environments both laser produced plasma (LPP) and gas discharge produced plasma (GDPP) configurations face serious issues regarding components lifetime and performance under particle bombardment, in particular collector mirrors. For both configurations debris, fast ions, fast neutrals, and condensable EUV radiator fuels (Li, Sn) can affect collector mirrors. In addition, collector mirrors are exposed to impurities (H,C,O,N), off-band radiation (depositing heat) and highly-charged ions leading to their degradation and consequently limiting 13.5 nm light reflection intensity. The IMPACT (Interaction of Materials with charged Particles and Components Testing) experiment at Argonne studies radiation-induced, thermodynamic and kinetic mechanisms that affect the performance of optical mirror surfaces. Results of optical component interaction with singly-charged inert gases (Xe) and alternate radiators (e.g. Sn) are presented for glancing incidence mirrors (i.e., Ru, Pd) at bombarding energies between 100-1000 eV at room temperature. Measurements conducted include: In-situ surface analysis: Auger electron spectroscopy, X-ray photoelectron spectroscopy, direct recoil spectroscopy and low-energy ion scattering spectroscopy; Ex-situ surface analysis: X-ray reflectivity, X-ray diffraction, atomic force microscopy and at-wavelength EUV reflectivity (NIST-SURF).

Original languageEnglish (US)
Article number136
Pages (from-to)1110-1117
Number of pages8
JournalProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume5751
Issue numberII
DOIs
StatePublished - Sep 19 2005
EventEmerging Lithographic Technologies IX - San Jose, CA, United States
Duration: Mar 1 2005Mar 3 2005

Fingerprint

Extreme ultraviolet lithography
accumulators
erosion
bombardment
Erosion
Spectrum Analysis
lithography
Surface analysis
Radiators
Ions
mirrors
degradation
Degradation
Spectroscopy
Plasma Gases
Radiation
Light reflection
Laser produced plasmas
Noble Gases
radiators

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging

Cite this

Allain, Jean Paul ; Hassanein, Ahmed ; Nieto, Martin ; Titov, Vladimir ; Plotkin, Perry ; Hinson, Edward ; Rice, Bryan J. ; Bristol, R. ; Rokusek, Daniel ; Lytle, Wayne ; Heuser, Brent J. ; Allain, Monica M.C. ; Ju, Hyunsu ; Chrobak, Christopher. / Erosion and degradation of EUV lithography collector mirrors under particle bombardment. In: Progress in Biomedical Optics and Imaging - Proceedings of SPIE. 2005 ; Vol. 5751, No. II. pp. 1110-1117.
@article{088b96e43a954457b83f67b689a913bc,
title = "Erosion and degradation of EUV lithography collector mirrors under particle bombardment",
abstract = "In extreme ultraviolet lithography (EUVL) environments both laser produced plasma (LPP) and gas discharge produced plasma (GDPP) configurations face serious issues regarding components lifetime and performance under particle bombardment, in particular collector mirrors. For both configurations debris, fast ions, fast neutrals, and condensable EUV radiator fuels (Li, Sn) can affect collector mirrors. In addition, collector mirrors are exposed to impurities (H,C,O,N), off-band radiation (depositing heat) and highly-charged ions leading to their degradation and consequently limiting 13.5 nm light reflection intensity. The IMPACT (Interaction of Materials with charged Particles and Components Testing) experiment at Argonne studies radiation-induced, thermodynamic and kinetic mechanisms that affect the performance of optical mirror surfaces. Results of optical component interaction with singly-charged inert gases (Xe) and alternate radiators (e.g. Sn) are presented for glancing incidence mirrors (i.e., Ru, Pd) at bombarding energies between 100-1000 eV at room temperature. Measurements conducted include: In-situ surface analysis: Auger electron spectroscopy, X-ray photoelectron spectroscopy, direct recoil spectroscopy and low-energy ion scattering spectroscopy; Ex-situ surface analysis: X-ray reflectivity, X-ray diffraction, atomic force microscopy and at-wavelength EUV reflectivity (NIST-SURF).",
author = "Allain, {Jean Paul} and Ahmed Hassanein and Martin Nieto and Vladimir Titov and Perry Plotkin and Edward Hinson and Rice, {Bryan J.} and R. Bristol and Daniel Rokusek and Wayne Lytle and Heuser, {Brent J.} and Allain, {Monica M.C.} and Hyunsu Ju and Christopher Chrobak",
year = "2005",
month = "9",
day = "19",
doi = "10.1117/12.598515",
language = "English (US)",
volume = "5751",
pages = "1110--1117",
journal = "Progress in Biomedical Optics and Imaging - Proceedings of SPIE",
issn = "1605-7422",
publisher = "SPIE",
number = "II",

}

Allain, JP, Hassanein, A, Nieto, M, Titov, V, Plotkin, P, Hinson, E, Rice, BJ, Bristol, R, Rokusek, D, Lytle, W, Heuser, BJ, Allain, MMC, Ju, H & Chrobak, C 2005, 'Erosion and degradation of EUV lithography collector mirrors under particle bombardment', Progress in Biomedical Optics and Imaging - Proceedings of SPIE, vol. 5751, no. II, 136, pp. 1110-1117. https://doi.org/10.1117/12.598515

Erosion and degradation of EUV lithography collector mirrors under particle bombardment. / Allain, Jean Paul; Hassanein, Ahmed; Nieto, Martin; Titov, Vladimir; Plotkin, Perry; Hinson, Edward; Rice, Bryan J.; Bristol, R.; Rokusek, Daniel; Lytle, Wayne; Heuser, Brent J.; Allain, Monica M.C.; Ju, Hyunsu; Chrobak, Christopher.

In: Progress in Biomedical Optics and Imaging - Proceedings of SPIE, Vol. 5751, No. II, 136, 19.09.2005, p. 1110-1117.

Research output: Contribution to journalConference article

TY - JOUR

T1 - Erosion and degradation of EUV lithography collector mirrors under particle bombardment

AU - Allain, Jean Paul

AU - Hassanein, Ahmed

AU - Nieto, Martin

AU - Titov, Vladimir

AU - Plotkin, Perry

AU - Hinson, Edward

AU - Rice, Bryan J.

AU - Bristol, R.

AU - Rokusek, Daniel

AU - Lytle, Wayne

AU - Heuser, Brent J.

AU - Allain, Monica M.C.

AU - Ju, Hyunsu

AU - Chrobak, Christopher

PY - 2005/9/19

Y1 - 2005/9/19

N2 - In extreme ultraviolet lithography (EUVL) environments both laser produced plasma (LPP) and gas discharge produced plasma (GDPP) configurations face serious issues regarding components lifetime and performance under particle bombardment, in particular collector mirrors. For both configurations debris, fast ions, fast neutrals, and condensable EUV radiator fuels (Li, Sn) can affect collector mirrors. In addition, collector mirrors are exposed to impurities (H,C,O,N), off-band radiation (depositing heat) and highly-charged ions leading to their degradation and consequently limiting 13.5 nm light reflection intensity. The IMPACT (Interaction of Materials with charged Particles and Components Testing) experiment at Argonne studies radiation-induced, thermodynamic and kinetic mechanisms that affect the performance of optical mirror surfaces. Results of optical component interaction with singly-charged inert gases (Xe) and alternate radiators (e.g. Sn) are presented for glancing incidence mirrors (i.e., Ru, Pd) at bombarding energies between 100-1000 eV at room temperature. Measurements conducted include: In-situ surface analysis: Auger electron spectroscopy, X-ray photoelectron spectroscopy, direct recoil spectroscopy and low-energy ion scattering spectroscopy; Ex-situ surface analysis: X-ray reflectivity, X-ray diffraction, atomic force microscopy and at-wavelength EUV reflectivity (NIST-SURF).

AB - In extreme ultraviolet lithography (EUVL) environments both laser produced plasma (LPP) and gas discharge produced plasma (GDPP) configurations face serious issues regarding components lifetime and performance under particle bombardment, in particular collector mirrors. For both configurations debris, fast ions, fast neutrals, and condensable EUV radiator fuels (Li, Sn) can affect collector mirrors. In addition, collector mirrors are exposed to impurities (H,C,O,N), off-band radiation (depositing heat) and highly-charged ions leading to their degradation and consequently limiting 13.5 nm light reflection intensity. The IMPACT (Interaction of Materials with charged Particles and Components Testing) experiment at Argonne studies radiation-induced, thermodynamic and kinetic mechanisms that affect the performance of optical mirror surfaces. Results of optical component interaction with singly-charged inert gases (Xe) and alternate radiators (e.g. Sn) are presented for glancing incidence mirrors (i.e., Ru, Pd) at bombarding energies between 100-1000 eV at room temperature. Measurements conducted include: In-situ surface analysis: Auger electron spectroscopy, X-ray photoelectron spectroscopy, direct recoil spectroscopy and low-energy ion scattering spectroscopy; Ex-situ surface analysis: X-ray reflectivity, X-ray diffraction, atomic force microscopy and at-wavelength EUV reflectivity (NIST-SURF).

UR - http://www.scopus.com/inward/record.url?scp=24644512196&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=24644512196&partnerID=8YFLogxK

U2 - 10.1117/12.598515

DO - 10.1117/12.598515

M3 - Conference article

AN - SCOPUS:24644512196

VL - 5751

SP - 1110

EP - 1117

JO - Progress in Biomedical Optics and Imaging - Proceedings of SPIE

JF - Progress in Biomedical Optics and Imaging - Proceedings of SPIE

SN - 1605-7422

IS - II

M1 - 136

ER -