Erratum: Enhancement of optical activity of chiral sculptured thin films by suitable infiltration of void regions (Optik International Journal for Light and Electron Optics, (2001) 112 (145-148))

Research output: Contribution to journalComment/debate

5 Scopus citations
Original languageEnglish (US)
Number of pages1
JournalOptik (Jena)
Volume112
Issue number11
StatePublished - Jan 1 2001

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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