Erratum: Enhancement of optical activity of chiral sculptured thin films by suitable infiltration of void regions (Optik International Journal for Light and Electron Optics, (2001) 112 (145-148))

Akhlesh Lakhtakia

doi:10.1078/0030-4026-00088

Erratum: Enhancement of optical activity of chiral sculptured thin films by suitable infiltration of void regions (Optik International Journal for Light and Electron Optics, (2001) 112 (145-148))

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English (US)
Pages (from-to)	544
Number of pages	1
Journal	Optik (Jena)
Volume	112
Issue number	11
DOIs	https://doi.org/10.1078/0030-4026-00088
State	Published - 2001

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

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10.1078/0030-4026-00088

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Erratum: Enhancement of optical activity of chiral sculptured thin films by suitable infiltration of void regions (Optik International Journal for Light and Electron Optics, (2001) 112 (145-148))

All Science Journal Classification (ASJC) codes

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