| Original language | English (US) |
|---|---|
| Number of pages | 1 |
| Journal | Optik (Jena) |
| Volume | 112 |
| Issue number | 11 |
| State | Published - Jan 1 2001 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering
Cite this
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Erratum : Enhancement of optical activity of chiral sculptured thin films by suitable infiltration of void regions (Optik International Journal for Light and Electron Optics, (2001) 112 (145-148)). / Lakhtakia, Akhlesh.
In: Optik (Jena), Vol. 112, No. 11, 01.01.2001.Research output: Contribution to journal › Comment/debate
TY - JOUR
T1 - Erratum
T2 - Enhancement of optical activity of chiral sculptured thin films by suitable infiltration of void regions (Optik International Journal for Light and Electron Optics, (2001) 112 (145-148))
AU - Lakhtakia, Akhlesh
PY - 2001/1/1
Y1 - 2001/1/1
UR - http://www.scopus.com/inward/record.url?scp=0035680340&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0035680340&partnerID=8YFLogxK
M3 - Comment/debate
AN - SCOPUS:0035680340
VL - 112
JO - Optik
JF - Optik
SN - 0030-4026
IS - 11
ER -