Erratum: Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756))

J. M. Delucca, H. S. Venugopalan, Suzanne E. Mohney, R. F. Karlicek

Research output: Contribution to journal › Comment/debate

Original languageEnglish (US)
Number of pages1
JournalApplied Physics Letters
Volume74
Issue number14
DOIs
StatePublished - Apr 5 1999

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electrodeposition
electric contacts
vapor deposition

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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Delucca, J. M. ; Venugopalan, H. S. ; Mohney, Suzanne E. ; Karlicek, R. F. / Erratum : Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756)). In: Applied Physics Letters. 1999 ; Vol. 74, No. 14.
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Delucca, JM, Venugopalan, HS, Mohney, SE & Karlicek, RF 1999, 'Erratum: Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756))', Applied Physics Letters, vol. 74, no. 14. https://doi.org/10.1063/1.123769

Erratum : Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756)). / Delucca, J. M.; Venugopalan, H. S.; Mohney, Suzanne E.; Karlicek, R. F.

In: Applied Physics Letters, Vol. 74, No. 14, 05.04.1999.

Research output: Contribution to journal › Comment/debate

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AU - Delucca, J. M.

AU - Venugopalan, H. S.

AU - Mohney, Suzanne E.

AU - Karlicek, R. F.

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SN - 0003-6951

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Delucca JM, Venugopalan HS, Mohney SE, Karlicek RF. Erratum: Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756)). Applied Physics Letters. 1999 Apr 5;74(14). https://doi.org/10.1063/1.123769

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