Erratum: Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756))

J. M. Delucca; H. S. Venugopalan; Suzanne E. Mohney; R. F. Karlicek

doi:10.1063/1.123769

Erratum: Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756))

J. M. Delucca, H. S. Venugopalan, Suzanne E. Mohney, R. F. Karlicek

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English (US)
Number of pages	1
Journal	Applied Physics Letters
Volume	74
Issue number	14
DOIs	https://doi.org/10.1063/1.123769
State	Published - Apr 5 1999

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.123769

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Erratum: Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756))

All Science Journal Classification (ASJC) codes

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