Erratum: Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756))

J. M. Delucca, H. S. Venugopalan, Suzanne E. Mohney, R. F. Karlicek

Research output: Contribution to journalComment/debate

Original languageEnglish (US)
Number of pages1
JournalApplied Physics Letters
Volume74
Issue number14
DOIs
StatePublished - Apr 5 1999

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electrodeposition
electric contacts
vapor deposition

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

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title = "Erratum: Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756))",
author = "Delucca, {J. M.} and Venugopalan, {H. S.} and Mohney, {Suzanne E.} and Karlicek, {R. F.}",
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}

Erratum : Ohmic contacts formed by electrodeposition and physical vapor deposition on [formula omitted] (Appl. Phys. Lett. (1998) 73 (3402) (10.1063/1.122756)). / Delucca, J. M.; Venugopalan, H. S.; Mohney, Suzanne E.; Karlicek, R. F.

In: Applied Physics Letters, Vol. 74, No. 14, 05.04.1999.

Research output: Contribution to journalComment/debate

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AU - Venugopalan, H. S.

AU - Mohney, Suzanne E.

AU - Karlicek, R. F.

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JO - Applied Physics Letters

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