Erratum: Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))

Susanne Stemmer, Zhiqiang Chen, Ralf Keding, Jon-Paul Maria, Dwi Wicaksana, Angus I. Kingon

Research output: Contribution to journalComment/debate

Original languageEnglish (US)
Number of pages1
JournalJournal of Applied Physics
Volume92
Issue number11
DOIs
StatePublished - Dec 1 2002

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partial pressure
physics
oxygen

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

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title = "Erratum: Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))",
author = "Susanne Stemmer and Zhiqiang Chen and Ralf Keding and Jon-Paul Maria and Dwi Wicaksana and Kingon, {Angus I.}",
year = "2002",
month = "12",
day = "1",
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language = "English (US)",
volume = "92",
journal = "Journal of Applied Physics",
issn = "0021-8979",
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Erratum : Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82)). / Stemmer, Susanne; Chen, Zhiqiang; Keding, Ralf; Maria, Jon-Paul; Wicaksana, Dwi; Kingon, Angus I.

In: Journal of Applied Physics, Vol. 92, No. 11, 01.12.2002.

Research output: Contribution to journalComment/debate

TY - JOUR

T1 - Erratum

T2 - Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))

AU - Stemmer, Susanne

AU - Chen, Zhiqiang

AU - Keding, Ralf

AU - Maria, Jon-Paul

AU - Wicaksana, Dwi

AU - Kingon, Angus I.

PY - 2002/12/1

Y1 - 2002/12/1

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UR - http://www.scopus.com/inward/citedby.url?scp=0036906189&partnerID=8YFLogxK

U2 - 10.1063/1.1519098

DO - 10.1063/1.1519098

M3 - Comment/debate

AN - SCOPUS:0036906189

VL - 92

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 11

ER -