Erratum: Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))

Susanne Stemmer, Zhiqiang Chen, Ralf Keding, Jon-Paul Maria, Dwi Wicaksana, Angus I. Kingon

Research output: Contribution to journalComment/debate

Original languageEnglish (US)
Number of pages1
JournalJournal of Applied Physics
Volume92
Issue number11
DOIs
StatePublished - Dec 1 2002

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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