Erratum: Stability of ZrO2 layers on Si (001) during high-temperature anneals under reduced oxygen partial pressures (Journal of Applied Physics (2002) 92 (82))

Susanne Stemmer, Zhiqiang Chen, Ralf Keding, Jon Paul Maria, Dwi Wicaksana, Angus I. Kingon

Research output: Contribution to journalComment/debatepeer-review

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