EUV emission study of a 600 joules small plasma focus device

S. H. Lee, S. L. Yap, C. S. Wong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A small plasma focus with electrical input energy of 600 joules has been developed as a radiation source. Radiation from argon discharge is being investigated. X-Ray Diode (XRD) is employed to measure the ultra-soft radiation while Extreme Ultraviolet (EUV )radiation at 13.5 nm wavelength has been investigated by a SXUV5A photodiode with integrated filter. The relation of the intensities of the EUV and ultra-soft X-ray with the operating pressure will be discussed. The average total EUV energy and the average EUV energy conversion efficiency are found to vary from 7.8 mJ to 275 mJ and 0.0013 % to 0.046 %, respectively.

Original languageEnglish (US)
Title of host publicationProgress of Physics Research in Malaysia, PERFIK2009
Pages444-447
Number of pages4
DOIs
Publication statusPublished - Dec 20 2010
EventProgress of Physics Research in Malaysia, PERFIK2009 - Malacca, Malaysia
Duration: Dec 7 2009Dec 9 2009

Publication series

NameAIP Conference Proceedings
Volume1250
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

ConferenceProgress of Physics Research in Malaysia, PERFIK2009
CountryMalaysia
CityMalacca
Period12/7/0912/9/09

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All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Lee, S. H., Yap, S. L., & Wong, C. S. (2010). EUV emission study of a 600 joules small plasma focus device. In Progress of Physics Research in Malaysia, PERFIK2009 (pp. 444-447). (AIP Conference Proceedings; Vol. 1250). https://doi.org/10.1063/1.3469704