@inproceedings{f229d7b606aa4e26a7befb0c5e7da5f6,
title = "EUV emission study of a 600 joules small plasma focus device",
abstract = "A small plasma focus with electrical input energy of 600 joules has been developed as a radiation source. Radiation from argon discharge is being investigated. X-Ray Diode (XRD) is employed to measure the ultra-soft radiation while Extreme Ultraviolet (EUV )radiation at 13.5 nm wavelength has been investigated by a SXUV5A photodiode with integrated filter. The relation of the intensities of the EUV and ultra-soft X-ray with the operating pressure will be discussed. The average total EUV energy and the average EUV energy conversion efficiency are found to vary from 7.8 mJ to 275 mJ and 0.0013 % to 0.046 %, respectively.",
author = "Lee, {S. H.} and Yap, {S. L.} and Wong, {C. S.}",
year = "2010",
doi = "10.1063/1.3469704",
language = "English (US)",
isbn = "9780735407978",
series = "AIP Conference Proceedings",
pages = "444--447",
booktitle = "Progress of Physics Research in Malaysia, PERFIK2009",
note = "Progress of Physics Research in Malaysia, PERFIK2009 ; Conference date: 07-12-2009 Through 09-12-2009",
}