EUV emission study of a 600 joules small plasma focus device

S. H. Lee; S. L. Yap; C. S. Wong

doi:10.1063/1.3469704

EUV emission study of a 600 joules small plasma focus device

S. H. Lee, S. L. Yap, C. S. Wong

Materials Research Institute (MRI)

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

A small plasma focus with electrical input energy of 600 joules has been developed as a radiation source. Radiation from argon discharge is being investigated. X-Ray Diode (XRD) is employed to measure the ultra-soft radiation while Extreme Ultraviolet (EUV )radiation at 13.5 nm wavelength has been investigated by a SXUV5A photodiode with integrated filter. The relation of the intensities of the EUV and ultra-soft X-ray with the operating pressure will be discussed. The average total EUV energy and the average EUV energy conversion efficiency are found to vary from 7.8 mJ to 275 mJ and 0.0013 % to 0.046 %, respectively.

Original language	English (US)
Title of host publication	Progress of Physics Research in Malaysia, PERFIK2009
Pages	444-447
Number of pages	4
DOIs	https://doi.org/10.1063/1.3469704
Publication status	Published - Dec 20 2010
Event	Progress of Physics Research in Malaysia, PERFIK2009 - Malacca, Malaysia Duration: Dec 7 2009 → Dec 9 2009

Publication series

Name	AIP Conference Proceedings
Volume	1250
ISSN (Print)	0094-243X
ISSN (Electronic)	1551-7616

Conference

Conference	Progress of Physics Research in Malaysia, PERFIK2009
Country	Malaysia
City	Malacca
Period	12/7/09 → 12/9/09

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All Science Journal Classification (ASJC) codes

Physics and Astronomy(all)

Cite this

Lee, S. H., Yap, S. L., & Wong, C. S. (2010). EUV emission study of a 600 joules small plasma focus device. In Progress of Physics Research in Malaysia, PERFIK2009 (pp. 444-447). (AIP Conference Proceedings; Vol. 1250). https://doi.org/10.1063/1.3469704

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AB - A small plasma focus with electrical input energy of 600 joules has been developed as a radiation source. Radiation from argon discharge is being investigated. X-Ray Diode (XRD) is employed to measure the ultra-soft radiation while Extreme Ultraviolet (EUV )radiation at 13.5 nm wavelength has been investigated by a SXUV5A photodiode with integrated filter. The relation of the intensities of the EUV and ultra-soft X-ray with the operating pressure will be discussed. The average total EUV energy and the average EUV energy conversion efficiency are found to vary from 7.8 mJ to 275 mJ and 0.0013 % to 0.046 %, respectively.

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Access to Document

10.1063/1.3469704