This article discusses various aspects of such a hypothetical transition, first explaining some of the deficiencies of liquid-phase cleaning and then considering possible approaches to gas-phase cleaning technology. Finally, some examples of dry-cleaning processes are presented. While these examples specifically address the dry cleaning of silicon, the article's general discussion is relevant to any semiconductor material.
|Original language||English (US)|
|Number of pages||5|
|State||Published - Mar 1 1988|
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