EVALUATING THE FEASIBILITY OF DRY CLEANING OF SILICON WAFERS.

Jerzy Ruzyllo

Research output: Contribution to journalArticle

13 Scopus citations

Abstract

This article discusses various aspects of such a hypothetical transition, first explaining some of the deficiencies of liquid-phase cleaning and then considering possible approaches to gas-phase cleaning technology. Finally, some examples of dry-cleaning processes are presented. While these examples specifically address the dry cleaning of silicon, the article's general discussion is relevant to any semiconductor material.

Original languageEnglish (US)
Pages (from-to)39-43
Number of pages5
JournalMicrocontamination
Volume6
Issue number3
StatePublished - Mar 1 1988

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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