Evaluation of Atomic Layer Deposition coating as gas barrier against hydrogen gas and humidity

Damoon Sohrabi Baba Heidary, Clive A. Randall

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Effectiveness of HfO2 Atomic Layer Deposition coatings has been studied on ZnO varistors by I-V tests, impedance spectroscopy, and highly accelerated life test. Based on impedance spectroscopy analyses, the proton diffusion coefficient was measured to be 400 K times less in the coating. Transmission electron microscopy analysis shows that Atomic Layer Deposition films are continuous and conformal. After exposure to high temperature, partial crystallization was detected in the coating and increases proton diffusion coefficient by 150 times.

Original languageEnglish (US)
Pages (from-to)30-33
Number of pages4
JournalScripta Materialia
Volume107
DOIs
StatePublished - Oct 1 2015

Fingerprint

Atomic layer deposition
atomic layer epitaxy
humidity
Hydrogen
Atmospheric humidity
Gases
coatings
Coatings
Protons
evaluation
hydrogen
diffusion coefficient
accelerated life tests
gases
Spectroscopy
impedance
varistors
Varistors
protons
Crystallization

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys

Cite this

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Evaluation of Atomic Layer Deposition coating as gas barrier against hydrogen gas and humidity. / Sohrabi Baba Heidary, Damoon; Randall, Clive A.

In: Scripta Materialia, Vol. 107, 01.10.2015, p. 30-33.

Research output: Contribution to journalArticle

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