Evaluation of Atomic Layer Deposition coating as gas barrier against hydrogen gas and humidity

Damoon Sohrabi Baba Heidary; Clive A. Randall

doi:10.1016/j.scriptamat.2015.05.013

Evaluation of Atomic Layer Deposition coating as gas barrier against hydrogen gas and humidity

Damoon Sohrabi Baba Heidary, Clive A. Randall

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Effectiveness of HfO₂ Atomic Layer Deposition coatings has been studied on ZnO varistors by I-V tests, impedance spectroscopy, and highly accelerated life test. Based on impedance spectroscopy analyses, the proton diffusion coefficient was measured to be 400 K times less in the coating. Transmission electron microscopy analysis shows that Atomic Layer Deposition films are continuous and conformal. After exposure to high temperature, partial crystallization was detected in the coating and increases proton diffusion coefficient by 150 times.

Original language	English (US)
Pages (from-to)	30-33
Number of pages	4
Journal	Scripta Materialia
Volume	107
DOIs	https://doi.org/10.1016/j.scriptamat.2015.05.013
State	Published - Oct 1 2015

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering
Metals and Alloys

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10.1016/j.scriptamat.2015.05.013

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title = "Evaluation of Atomic Layer Deposition coating as gas barrier against hydrogen gas and humidity",

abstract = "Effectiveness of HfO2 Atomic Layer Deposition coatings has been studied on ZnO varistors by I-V tests, impedance spectroscopy, and highly accelerated life test. Based on impedance spectroscopy analyses, the proton diffusion coefficient was measured to be 400 K times less in the coating. Transmission electron microscopy analysis shows that Atomic Layer Deposition films are continuous and conformal. After exposure to high temperature, partial crystallization was detected in the coating and increases proton diffusion coefficient by 150 times.",

author = "{Sohrabi Baba Heidary}, Damoon and Randall, {Clive A.}",

note = "Funding Information: This material is based upon work supported by the National Science Foundation , as part of the Center for Dielectrics and Piezoelectrics under Grant No. IIP-1361503 and 1361571 . Publisher Copyright: {\textcopyright} 2015 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.",

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AU - Sohrabi Baba Heidary, Damoon

AU - Randall, Clive A.

N1 - Funding Information: This material is based upon work supported by the National Science Foundation , as part of the Center for Dielectrics and Piezoelectrics under Grant No. IIP-1361503 and 1361571 . Publisher Copyright: © 2015 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

PY - 2015/10/1

Y1 - 2015/10/1

N2 - Effectiveness of HfO2 Atomic Layer Deposition coatings has been studied on ZnO varistors by I-V tests, impedance spectroscopy, and highly accelerated life test. Based on impedance spectroscopy analyses, the proton diffusion coefficient was measured to be 400 K times less in the coating. Transmission electron microscopy analysis shows that Atomic Layer Deposition films are continuous and conformal. After exposure to high temperature, partial crystallization was detected in the coating and increases proton diffusion coefficient by 150 times.

AB - Effectiveness of HfO2 Atomic Layer Deposition coatings has been studied on ZnO varistors by I-V tests, impedance spectroscopy, and highly accelerated life test. Based on impedance spectroscopy analyses, the proton diffusion coefficient was measured to be 400 K times less in the coating. Transmission electron microscopy analysis shows that Atomic Layer Deposition films are continuous and conformal. After exposure to high temperature, partial crystallization was detected in the coating and increases proton diffusion coefficient by 150 times.

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JO - Scripta Materialia

JF - Scripta Materialia

ER -

Evaluation of Atomic Layer Deposition coating as gas barrier against hydrogen gas and humidity

Abstract

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