Evaluation of new high temperature boron solid planar diffusion sources through p-n junction characterization

D. K. Hwang, R. E. Tressler, J. Ruzyllo

Research output: Contribution to journalArticlepeer-review

Abstract

The electrical characterization of p-n diodes fabricated using a newly developed high temperature (≥ 1100 °C) boron diffusion source consisting of a homogenous distribution of 9Al2O3·2B2O3 in a SiC foam substrate was carried out and results were compared with those obtained using commercial sources. Specifically, current-voltage and open circuit voltage decay measurements were performed. The results obtained indicate that devices fabricated from the new high temperature source perform satisfactorily, exhibiting characteristics that are comparable to the characteristics of devices fabricated from the established commercial high temperature boron diffusion sources.

Original languageEnglish (US)
Pages (from-to)16-19
Number of pages4
JournalThin Solid Films
Volume250
Issue number1-2
DOIs
StatePublished - Oct 1 1994

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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