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Evaluation of thin oxides grown by the atomic oxygen afterglow method
J. Ruzyllo, A. Hoff, G. Ruggles
Materials Research Institute (MRI)
Research output
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Contribution to journal
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Article
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peer-review
7
Scopus citations
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Physics & Astronomy
oxygen afterglow
100%
evaluation
31%
oxides
30%
gas discharges
22%
breakdown
15%
electrical properties
14%
diluents
13%
very large scale integration
11%
silicon
10%
statistics
7%
silicon dioxide
7%
oxidation
7%
nitrogen
7%
microwaves
6%
hydrogen
6%
oxygen
5%
temperature
2%
Engineering & Materials Science
Oxides
42%
Oxygen
40%
Electric properties
21%
Plasmas
18%
Silicon
15%
Charge density
13%
Gases
11%
Silica
10%
Nitrogen
9%
Oxidation
8%
Microwaves
8%
Hydrogen
7%
Statistics
7%
Chemical analysis
6%
Temperature
3%
Chemical Compounds
Oxide
26%
Dioxygen
24%
Electrical Property
16%
Plasma
12%
Silicon Dioxide
12%
Diluting Agent
10%
Gas
10%
Charge Density
9%
Microwave
8%
Nitrogen
6%
Hydrogen
5%
Liquid Film
4%
Oxidation Reaction
4%
Application
3%