Evidence for a Deep Electron Trap and Charge Compensation in Separation by Implanted Oxygen Oxides

J. F. Conley, Patrick M. Lenahan, P. Roitman

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

We present direct evidence for the creation of deep electron traps in Separation by IMplantation of OXygen buried oxides. In addition, we present combined electrical and electron spin resonance evidence which demonstrate that at least some positively charged paramagnetic E' centers are compensated by negatively charged centers. Finally, we present evidence which strongly suggests that a substantial fraction the deep electron traps are coupled to E' centers.

Original languageEnglish (US)
Pages (from-to)2114-2120
Number of pages7
JournalIEEE Transactions on Nuclear Science
Volume39
Issue number6
DOIs
StatePublished - Jan 1 1992

Fingerprint

Electron traps
traps
Oxides
Oxygen
oxides
oxygen
Paramagnetic resonance
electrons
implantation
electron paramagnetic resonance
Compensation and Redress

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Nuclear Energy and Engineering
  • Electrical and Electronic Engineering

Cite this

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Evidence for a Deep Electron Trap and Charge Compensation in Separation by Implanted Oxygen Oxides. / Conley, J. F.; Lenahan, Patrick M.; Roitman, P.

In: IEEE Transactions on Nuclear Science, Vol. 39, No. 6, 01.01.1992, p. 2114-2120.

Research output: Contribution to journalArticle

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