Numerous research efforts are targeting new devices that could continue performance scaling trends associated with Moore's Law and/or accomplish computational tasks with less energy. One such device is the ferroelectric FET (FeFET), which offers the potential to be scaled beyond the end of the silicon roadmap as predicted by ITRS. Furthermore, the Ids vs. Vgs characteristics of FeFETs may allow a device to function as both a switch and a non-volatile storage element. We exploit this FeFET property to enable fine-grained logic-in-memory (LiM). We consider three different circuit design styles for FeFET-based LiM: complementary (differential), dynamic current mode, and dynamic logic. Our designs are compared with existing approaches for LiM (i.e., based on magnetic tunnel junctions (MTJs), CMOS, etc.) that afford the same circuit-level functionality. Assuming similar feature sizes, non-volatile FeFET-based LiM circuits are more efficient than functional equivalents based on MTJs when considering metrics such as propagation delay (2.9X, 6.8X) and dyanmic power (3.7X, 2.3X) (for 45 nm, 22 nm technology respectively). Compared to CMOS functional equivalents, FeFET designs still exhibit modest improvements in the aforementioned metrics while also offering non-volatility and reduced device count.