TY - JOUR
T1 - Extensions of molecular ruler technology for nanoscale patterning
AU - Srinivasan, C.
AU - Anderson, M. E.
AU - Carter, E. M.
AU - Hohman, J. N.
AU - Bharadwaja, S. S.N.
AU - Trolier-Mckinstry, S.
AU - Weiss, P. S.
AU - Horn, M. W.
N1 - Funding Information:
This research has been funded by the Air Force Office of Scientific Research, Army Research Office, Defense Advanced Research Projects Agency, National Science Foundation, National Institute of Standards and Technology, Office of Naval Research, Penn State Materials Research Institute, Penn State Nanofabrication Facility of the NSF-funded National Nanofabrication Infrastructure Network, and Penn State Center for Nanoscale Science, and NSF-funded Materials Research Science and Engineering Center. Parts of this work were conducted at the Penn State node of the NSF-funded National Nanotechnology Infrastructure Network. The authors would like to thank Raviprakash Jayaraman, Weiss group members, and the Penn State Nanofabrication Center staff for helpful interactions and discussions.
PY - 2006
Y1 - 2006
N2 - By combining optical lithography and chemical self-assembly, the authors circumvent the limitations of photolithography and provide a parallel, low-cost alternative to fabricate sub- 50 nm features. Self-assembled multilayers, composed of alternating layers of α,ω -mercaptoalkanoic acids and copper (II) ions ("molecular rulers"), are used as an organic sidewall spacer resist on initial lithographic structures enabling the precise, proximal placement of a secondary structure via lift-off. Here, the authors implemented a positive-tone bilayer resist for improved line-edge characteristics of the secondary structure and evaluated the lithographic and electrical performance of nanostructures fabricated using this approach. Additionally, they describe extensions of this technique by which planar nanojunctions were created, and the generated nanometer-scale pattern was transferred to the underlying substrate.
AB - By combining optical lithography and chemical self-assembly, the authors circumvent the limitations of photolithography and provide a parallel, low-cost alternative to fabricate sub- 50 nm features. Self-assembled multilayers, composed of alternating layers of α,ω -mercaptoalkanoic acids and copper (II) ions ("molecular rulers"), are used as an organic sidewall spacer resist on initial lithographic structures enabling the precise, proximal placement of a secondary structure via lift-off. Here, the authors implemented a positive-tone bilayer resist for improved line-edge characteristics of the secondary structure and evaluated the lithographic and electrical performance of nanostructures fabricated using this approach. Additionally, they describe extensions of this technique by which planar nanojunctions were created, and the generated nanometer-scale pattern was transferred to the underlying substrate.
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U2 - 10.1116/1.2393252
DO - 10.1116/1.2393252
M3 - Article
AN - SCOPUS:33845254115
VL - 24
SP - 3200
EP - 3204
JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
SN - 1071-1023
IS - 6
ER -