Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration

Ross C. McCurdy, Randall L. McEntaffer, Jake A. McCoy, Drew M. Miles

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

We have fabricated a blazed X-ray reflection grating with a period of 160 nm using thermally activated selective topography equilibration (TASTE). The grating was tested for diffraction efficiency using the soft X-ray reflectometer at Lawrence Berkeley National Laboratory's Advanced Light Source. Preliminary results show total absolute diffraction efficiency ≥ 40% at lower energies, with maximum single order diffraction efficiency ranging from 20-40%. Total diffraction efficiency was ≥ 30% across the entire measured band pass of 180 eV to 1300 eV.

Original languageEnglish (US)
Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy IX
EditorsStephen L. O'Dell, Giovanni Pareschi
PublisherSPIE
ISBN (Electronic)9781510629318
DOIs
StatePublished - Jan 1 2019
EventOptics for EUV, X-Ray, and Gamma-Ray Astronomy IX 2019 - San Diego, United States
Duration: Aug 13 2019Aug 15 2019

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume11119
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceOptics for EUV, X-Ray, and Gamma-Ray Astronomy IX 2019
CountryUnited States
CitySan Diego
Period8/13/198/15/19

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    McCurdy, R. C., McEntaffer, R. L., McCoy, J. A., & Miles, D. M. (2019). Fabrication and diffraction efficiency of a 160-nm period x-ray reflection grating produced using thermally activated selective topography equilibration. In S. L. O'Dell, & G. Pareschi (Eds.), Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX [111190Y] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 11119). SPIE. https://doi.org/10.1117/12.2530052