Fabrication of a multilayered ceramic micro-plasma generating device

Amanda Baker, Clive A. Randall, Randall Stewart, Richard Fantazier, Fred Wise

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Plasma technology is currently being used in innumerable industrial applications. Some of the common uses of this technology include surface cleaning and treatment, sputtering and etching of semiconductor devices, excitation source for chemical analyses, cutting, environmental clean up, sterilization, and phototherapy. The harsh conditions that these devices must endure require robust refractory materials systems for their fabrication and reliability. Low Temperature Cofired Ceramic (LTCC) material systems provide a durable and cost effective platform for the manufacture of such devices, and allow for possible integration into meso-scale microsystems. Our designs are based on RF microstriplines that capacitively couple and ionize small gas discharge sites over the top electrode. In this paper, we have built several iterations of this micro-plasma generating device using LTCC materials systems. The impact of electrode ink selection and processing, lamination methods, dielectric layer thickness, and electrode design has been investigated. Several micro-plasma generating devices were then evaluated for power requirements, output stability and long-term reliability.

Original languageEnglish (US)
Title of host publicationIMAPS/ACerS - 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006
Pages444-448
Number of pages5
StatePublished - Dec 1 2006
Event2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006 - Denver, CO, United States
Duration: Apr 24 2006Apr 27 2006

Other

Other2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006
CountryUnited States
CityDenver, CO
Period4/24/064/27/06

Fingerprint

Plasma devices
Ceramic materials
Fabrication
Electrodes
Surface cleaning
Microsystems
Semiconductor devices
Ink
Discharge (fluid mechanics)
Refractory materials
Industrial applications
Sputtering
Surface treatment
Etching
Gases
Plasmas
Temperature
Processing
Costs

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Ceramics and Composites

Cite this

Baker, A., Randall, C. A., Stewart, R., Fantazier, R., & Wise, F. (2006). Fabrication of a multilayered ceramic micro-plasma generating device. In IMAPS/ACerS - 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006 (pp. 444-448)
Baker, Amanda ; Randall, Clive A. ; Stewart, Randall ; Fantazier, Richard ; Wise, Fred. / Fabrication of a multilayered ceramic micro-plasma generating device. IMAPS/ACerS - 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006. 2006. pp. 444-448
@inproceedings{252219c6e4ef41919cca18c20ef8888f,
title = "Fabrication of a multilayered ceramic micro-plasma generating device",
abstract = "Plasma technology is currently being used in innumerable industrial applications. Some of the common uses of this technology include surface cleaning and treatment, sputtering and etching of semiconductor devices, excitation source for chemical analyses, cutting, environmental clean up, sterilization, and phototherapy. The harsh conditions that these devices must endure require robust refractory materials systems for their fabrication and reliability. Low Temperature Cofired Ceramic (LTCC) material systems provide a durable and cost effective platform for the manufacture of such devices, and allow for possible integration into meso-scale microsystems. Our designs are based on RF microstriplines that capacitively couple and ionize small gas discharge sites over the top electrode. In this paper, we have built several iterations of this micro-plasma generating device using LTCC materials systems. The impact of electrode ink selection and processing, lamination methods, dielectric layer thickness, and electrode design has been investigated. Several micro-plasma generating devices were then evaluated for power requirements, output stability and long-term reliability.",
author = "Amanda Baker and Randall, {Clive A.} and Randall Stewart and Richard Fantazier and Fred Wise",
year = "2006",
month = "12",
day = "1",
language = "English (US)",
isbn = "9781604236200",
pages = "444--448",
booktitle = "IMAPS/ACerS - 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006",

}

Baker, A, Randall, CA, Stewart, R, Fantazier, R & Wise, F 2006, Fabrication of a multilayered ceramic micro-plasma generating device. in IMAPS/ACerS - 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006. pp. 444-448, 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006, Denver, CO, United States, 4/24/06.

Fabrication of a multilayered ceramic micro-plasma generating device. / Baker, Amanda; Randall, Clive A.; Stewart, Randall; Fantazier, Richard; Wise, Fred.

IMAPS/ACerS - 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006. 2006. p. 444-448.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Fabrication of a multilayered ceramic micro-plasma generating device

AU - Baker, Amanda

AU - Randall, Clive A.

AU - Stewart, Randall

AU - Fantazier, Richard

AU - Wise, Fred

PY - 2006/12/1

Y1 - 2006/12/1

N2 - Plasma technology is currently being used in innumerable industrial applications. Some of the common uses of this technology include surface cleaning and treatment, sputtering and etching of semiconductor devices, excitation source for chemical analyses, cutting, environmental clean up, sterilization, and phototherapy. The harsh conditions that these devices must endure require robust refractory materials systems for their fabrication and reliability. Low Temperature Cofired Ceramic (LTCC) material systems provide a durable and cost effective platform for the manufacture of such devices, and allow for possible integration into meso-scale microsystems. Our designs are based on RF microstriplines that capacitively couple and ionize small gas discharge sites over the top electrode. In this paper, we have built several iterations of this micro-plasma generating device using LTCC materials systems. The impact of electrode ink selection and processing, lamination methods, dielectric layer thickness, and electrode design has been investigated. Several micro-plasma generating devices were then evaluated for power requirements, output stability and long-term reliability.

AB - Plasma technology is currently being used in innumerable industrial applications. Some of the common uses of this technology include surface cleaning and treatment, sputtering and etching of semiconductor devices, excitation source for chemical analyses, cutting, environmental clean up, sterilization, and phototherapy. The harsh conditions that these devices must endure require robust refractory materials systems for their fabrication and reliability. Low Temperature Cofired Ceramic (LTCC) material systems provide a durable and cost effective platform for the manufacture of such devices, and allow for possible integration into meso-scale microsystems. Our designs are based on RF microstriplines that capacitively couple and ionize small gas discharge sites over the top electrode. In this paper, we have built several iterations of this micro-plasma generating device using LTCC materials systems. The impact of electrode ink selection and processing, lamination methods, dielectric layer thickness, and electrode design has been investigated. Several micro-plasma generating devices were then evaluated for power requirements, output stability and long-term reliability.

UR - http://www.scopus.com/inward/record.url?scp=84878222921&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84878222921&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84878222921

SN - 9781604236200

SP - 444

EP - 448

BT - IMAPS/ACerS - 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006

ER -

Baker A, Randall CA, Stewart R, Fantazier R, Wise F. Fabrication of a multilayered ceramic micro-plasma generating device. In IMAPS/ACerS - 2nd International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, CICMT 2006. 2006. p. 444-448