Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography

Gang Zhang, Lin Gan, Bai Yang, Dayang Wang, Helmuth Möhwald

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Due to the process simplicity, the low cost, and the accessibility of scaling down the feature size, colloidal lithography has drawn a great deal of attention once being developed. In this work we succeeded in fabricating asymmetric heterogeneous arrays of metallic NPs and asymmetric nanoshells via stepwise angle-resolved colloidal lithography. The present approach is independent of the sphere sizes of colloidal masks and the chemical nature of materials deposited, while it shows a profound dependence on the registry of colloidal masks with respect to the incidence vapor beam and the incidence angle. Such asymmetric heterogeneous arrays and asymmetric nanoshells are hard to construct by otherwise lithographic techniques.

Original languageEnglish (US)
Title of host publication2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
Pages277-279
Number of pages3
StatePublished - Dec 1 2009
Event2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009 - Genoa, Italy
Duration: Jul 26 2009Jul 30 2009

Publication series

Name2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009

Conference

Conference2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
CountryItaly
CityGenoa
Period7/26/097/30/09

All Science Journal Classification (ASJC) codes

  • Process Chemistry and Technology
  • Electrical and Electronic Engineering

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    Zhang, G., Gan, L., Yang, B., Wang, D., & Möhwald, H. (2009). Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography. In 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009 (pp. 277-279). [5394608] (2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009).