Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography

Gang Zhang, Lin Gan, Bai Yang, Dayang Wang, Helmuth Möhwald

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Due to the process simplicity, the low cost, and the accessibility of scaling down the feature size, colloidal lithography has drawn a great deal of attention once being developed. In this work we succeeded in fabricating asymmetric heterogeneous arrays of metallic NPs and asymmetric nanoshells via stepwise angle-resolved colloidal lithography. The present approach is independent of the sphere sizes of colloidal masks and the chemical nature of materials deposited, while it shows a profound dependence on the registry of colloidal masks with respect to the incidence vapor beam and the incidence angle. Such asymmetric heterogeneous arrays and asymmetric nanoshells are hard to construct by otherwise lithographic techniques.

Original languageEnglish (US)
Title of host publication2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
Pages277-279
Number of pages3
StatePublished - Dec 1 2009
Event2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009 - Genoa, Italy
Duration: Jul 26 2009Jul 30 2009

Publication series

Name2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009

Conference

Conference2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009
CountryItaly
CityGenoa
Period7/26/097/30/09

Fingerprint

Nanoshells
Lithography
Masks
Nanostructures
Fabrication
Microstructure
Vapors
Costs

All Science Journal Classification (ASJC) codes

  • Process Chemistry and Technology
  • Electrical and Electronic Engineering

Cite this

Zhang, G., Gan, L., Yang, B., Wang, D., & Möhwald, H. (2009). Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography. In 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009 (pp. 277-279). [5394608] (2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009).
Zhang, Gang ; Gan, Lin ; Yang, Bai ; Wang, Dayang ; Möhwald, Helmuth. / Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography. 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009. 2009. pp. 277-279 (2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009).
@inproceedings{4db6d78726624adbb648a274fc520cbf,
title = "Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography",
abstract = "Due to the process simplicity, the low cost, and the accessibility of scaling down the feature size, colloidal lithography has drawn a great deal of attention once being developed. In this work we succeeded in fabricating asymmetric heterogeneous arrays of metallic NPs and asymmetric nanoshells via stepwise angle-resolved colloidal lithography. The present approach is independent of the sphere sizes of colloidal masks and the chemical nature of materials deposited, while it shows a profound dependence on the registry of colloidal masks with respect to the incidence vapor beam and the incidence angle. Such asymmetric heterogeneous arrays and asymmetric nanoshells are hard to construct by otherwise lithographic techniques.",
author = "Gang Zhang and Lin Gan and Bai Yang and Dayang Wang and Helmuth M{\"o}hwald",
year = "2009",
month = "12",
day = "1",
language = "English (US)",
isbn = "9789810836948",
series = "2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009",
pages = "277--279",
booktitle = "2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009",

}

Zhang, G, Gan, L, Yang, B, Wang, D & Möhwald, H 2009, Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography. in 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009., 5394608, 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009, pp. 277-279, 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009, Genoa, Italy, 7/26/09.

Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography. / Zhang, Gang; Gan, Lin; Yang, Bai; Wang, Dayang; Möhwald, Helmuth.

2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009. 2009. p. 277-279 5394608 (2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography

AU - Zhang, Gang

AU - Gan, Lin

AU - Yang, Bai

AU - Wang, Dayang

AU - Möhwald, Helmuth

PY - 2009/12/1

Y1 - 2009/12/1

N2 - Due to the process simplicity, the low cost, and the accessibility of scaling down the feature size, colloidal lithography has drawn a great deal of attention once being developed. In this work we succeeded in fabricating asymmetric heterogeneous arrays of metallic NPs and asymmetric nanoshells via stepwise angle-resolved colloidal lithography. The present approach is independent of the sphere sizes of colloidal masks and the chemical nature of materials deposited, while it shows a profound dependence on the registry of colloidal masks with respect to the incidence vapor beam and the incidence angle. Such asymmetric heterogeneous arrays and asymmetric nanoshells are hard to construct by otherwise lithographic techniques.

AB - Due to the process simplicity, the low cost, and the accessibility of scaling down the feature size, colloidal lithography has drawn a great deal of attention once being developed. In this work we succeeded in fabricating asymmetric heterogeneous arrays of metallic NPs and asymmetric nanoshells via stepwise angle-resolved colloidal lithography. The present approach is independent of the sphere sizes of colloidal masks and the chemical nature of materials deposited, while it shows a profound dependence on the registry of colloidal masks with respect to the incidence vapor beam and the incidence angle. Such asymmetric heterogeneous arrays and asymmetric nanoshells are hard to construct by otherwise lithographic techniques.

UR - http://www.scopus.com/inward/record.url?scp=77950967717&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77950967717&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:77950967717

SN - 9789810836948

T3 - 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009

SP - 277

EP - 279

BT - 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009

ER -

Zhang G, Gan L, Yang B, Wang D, Möhwald H. Fabrication of asymmetric micro- and nanostructure based on stepwise angle-resolved colloidal lithography. In 2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009. 2009. p. 277-279. 5394608. (2009 9th IEEE Conference on Nanotechnology, IEEE NANO 2009).