Fabrication of free standing, three-dimensional, fibrous, thin film substrates of parylene C

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Abstract

Microscale ultraviolet lithography to pattern a silicon wafer, spin coating of a layer of soap solution and physicochemical vapour deposition of two thin films of parylene C were sequentially used in a seven-step procedure to fabricate free standing, three-dimensional, fibrous, thin film substrates of parylene C for biomedical application. The effects of the length scales of the photoresist pattern on the wafer, the flowrate of the reactive monomer flux of parylene C and redistributive diffusion of the monomer molecules on the top surfaces of the thin film substrates were established. The top surface morphology of a thin film substrate is controlled by the photoresist pattern and the volumetric morphology of a fibrous thin film. The bottom surface of the thin film substrate acquires a multiscale morphology both from the photoresist pattern and from the baking of the soap layer.

Original languageEnglish (US)
Pages (from-to)129-135
Number of pages7
JournalMaterials Research Innovations
Volume17
Issue number2
DOIs
StatePublished - Apr 1 2013

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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