Fabrication of free standing, three-dimensional, fibrous, thin film substrates of parylene C

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Microscale ultraviolet lithography to pattern a silicon wafer, spin coating of a layer of soap solution and physicochemical vapour deposition of two thin films of parylene C were sequentially used in a seven-step procedure to fabricate free standing, three-dimensional, fibrous, thin film substrates of parylene C for biomedical application. The effects of the length scales of the photoresist pattern on the wafer, the flowrate of the reactive monomer flux of parylene C and redistributive diffusion of the monomer molecules on the top surfaces of the thin film substrates were established. The top surface morphology of a thin film substrate is controlled by the photoresist pattern and the volumetric morphology of a fibrous thin film. The bottom surface of the thin film substrate acquires a multiscale morphology both from the photoresist pattern and from the baking of the soap layer.

Original languageEnglish (US)
Pages (from-to)129-135
Number of pages7
JournalMaterials Research Innovations
Volume17
Issue number2
DOIs
StatePublished - Apr 2013

Fingerprint

Fabrication
Thin films
fabrication
Substrates
Photoresists
thin films
photoresists
soaps
Soaps (detergents)
monomers
Monomers
wafers
Vapor deposition
baking
Spin coating
Silicon wafers
microbalances
Lithography
Surface morphology
coating

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

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abstract = "Microscale ultraviolet lithography to pattern a silicon wafer, spin coating of a layer of soap solution and physicochemical vapour deposition of two thin films of parylene C were sequentially used in a seven-step procedure to fabricate free standing, three-dimensional, fibrous, thin film substrates of parylene C for biomedical application. The effects of the length scales of the photoresist pattern on the wafer, the flowrate of the reactive monomer flux of parylene C and redistributive diffusion of the monomer molecules on the top surfaces of the thin film substrates were established. The top surface morphology of a thin film substrate is controlled by the photoresist pattern and the volumetric morphology of a fibrous thin film. The bottom surface of the thin film substrate acquires a multiscale morphology both from the photoresist pattern and from the baking of the soap layer.",
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Fabrication of free standing, three-dimensional, fibrous, thin film substrates of parylene C. / Wei, L.; Lakhtakia, Akhlesh.

In: Materials Research Innovations, Vol. 17, No. 2, 04.2013, p. 129-135.

Research output: Contribution to journalArticle

TY - JOUR

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