Fabrication of Ga-tcmplatcs using a focused ion beam

Hao Wang, Greg C. Hartman, Joshua Williams, Jennifer L. Gray

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

There are many factors that have the potential to limit significant advances in device technology. These include the ability to arrange materials at shrinking dimensions and the ability to successfully integrate new materials with better properties or new functionalities. To overcome these limitations, the development of advanced processing methods that can organize various combinations of materials at nano-scale dimensions with the necessary quality and reliability is required. We have explored using a gallium focused ion beam (FIB) as a method of integrating highly mismatched materials with silicon by creating template patterns directly on Si with nanoscale resolution. These templates are potentially useful as a means of locally controlling topography at nanoscale dimensions or as a means of locally implanting Ga at specific surface sites. We have annealed these templates in vacuum to study the effects of ion dosage on local Ga concentration and topography. We have also investigated the feasibility of creating Ga nanodots using this method that could eventually be converted to GaN through a nitridation process. Atomic force microscopy and electron microscopy characterization of the resulting structures are shown for a variety of patterning and processing conditions.

Original languageEnglish (US)
Title of host publicationNanoscale Pattern Formation
Pages54-59
Number of pages6
StatePublished - Oct 15 2010
Event2009 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 30 2009Dec 4 2009

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1228
ISSN (Print)0272-9172

Other

Other2009 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period11/30/0912/4/09

Fingerprint

Focused ion beams
templates
ion beams
Fabrication
fabrication
topography
Topography
Gallium
gallium
Nitridation
electron microscopy
Silicon
Processing
atomic force microscopy
Electron microscopy
microscopy
Atomic force microscopy
dosage
vacuum
silicon

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Wang, H., Hartman, G. C., Williams, J., & Gray, J. L. (2010). Fabrication of Ga-tcmplatcs using a focused ion beam. In Nanoscale Pattern Formation (pp. 54-59). (Materials Research Society Symposium Proceedings; Vol. 1228).
Wang, Hao ; Hartman, Greg C. ; Williams, Joshua ; Gray, Jennifer L. / Fabrication of Ga-tcmplatcs using a focused ion beam. Nanoscale Pattern Formation. 2010. pp. 54-59 (Materials Research Society Symposium Proceedings).
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Wang, H, Hartman, GC, Williams, J & Gray, JL 2010, Fabrication of Ga-tcmplatcs using a focused ion beam. in Nanoscale Pattern Formation. Materials Research Society Symposium Proceedings, vol. 1228, pp. 54-59, 2009 MRS Fall Meeting, Boston, MA, United States, 11/30/09.

Fabrication of Ga-tcmplatcs using a focused ion beam. / Wang, Hao; Hartman, Greg C.; Williams, Joshua; Gray, Jennifer L.

Nanoscale Pattern Formation. 2010. p. 54-59 (Materials Research Society Symposium Proceedings; Vol. 1228).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Wang H, Hartman GC, Williams J, Gray JL. Fabrication of Ga-tcmplatcs using a focused ion beam. In Nanoscale Pattern Formation. 2010. p. 54-59. (Materials Research Society Symposium Proceedings).