Fabrication of micromechanical devices from polysilicon films with smooth surfaces

H. Guckel, J. J. Sniegowski, T. R. Christenson, Suzanne E. Mohney, T. F. Kelly

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

Micromechanical devices such as bearings require smooth surfaces. Fine-grained polysilicon can be produced with a surface roughness near 8 Å rms. The ability to anneal films of this type into tension eliminates size restrictions due to compressive buckling. The use of these films in micromechanical devices has been restricted because hydrogen fluoride-etched structures are covered by an etch residue that leads to contact welding. Contact between opposing .surfaces is induced mainly by surface tension effects. This problem may be avoided by removing the deflection mechanism. Thus, freezing of a water-methanol rinse after sacrificial etching all but eliminates surface tension. Removal of the ice mixture via sublimation at 0.15 millibar occurs readily. Free-standing structures with smooth surfaces and small gaps are next passivated by silicon nitride deposition or other techniques.

Original languageEnglish (US)
Title of host publicationMicromechanics and MEMS
Subtitle of host publicationClassic and Seminal Papers to 1990
PublisherWiley-IEEE Press
Pages532-537
Number of pages6
ISBN (Electronic)9780470545263
ISBN (Print)0780310853, 9780780310858
DOIs
StatePublished - Jan 1 1997

Fingerprint

Polysilicon
Fabrication
fabrication
Surface tension
interfacial tension
Bearings (structural)
Sublimation
hydrofluoric acid
buckling
Silicon nitride
sublimation
welding
silicon nitrides
Freezing
freezing
Buckling
Ice
deflection
Etching
constrictions

All Science Journal Classification (ASJC) codes

  • Computer Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)
  • Energy(all)

Cite this

Guckel, H., Sniegowski, J. J., Christenson, T. R., Mohney, S. E., & Kelly, T. F. (1997). Fabrication of micromechanical devices from polysilicon films with smooth surfaces. In Micromechanics and MEMS: Classic and Seminal Papers to 1990 (pp. 532-537). Wiley-IEEE Press. https://doi.org/10.1109/9780470545263.sect10
Guckel, H. ; Sniegowski, J. J. ; Christenson, T. R. ; Mohney, Suzanne E. ; Kelly, T. F. / Fabrication of micromechanical devices from polysilicon films with smooth surfaces. Micromechanics and MEMS: Classic and Seminal Papers to 1990. Wiley-IEEE Press, 1997. pp. 532-537
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Guckel, H, Sniegowski, JJ, Christenson, TR, Mohney, SE & Kelly, TF 1997, Fabrication of micromechanical devices from polysilicon films with smooth surfaces. in Micromechanics and MEMS: Classic and Seminal Papers to 1990. Wiley-IEEE Press, pp. 532-537. https://doi.org/10.1109/9780470545263.sect10

Fabrication of micromechanical devices from polysilicon films with smooth surfaces. / Guckel, H.; Sniegowski, J. J.; Christenson, T. R.; Mohney, Suzanne E.; Kelly, T. F.

Micromechanics and MEMS: Classic and Seminal Papers to 1990. Wiley-IEEE Press, 1997. p. 532-537.

Research output: Chapter in Book/Report/Conference proceedingChapter

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Guckel H, Sniegowski JJ, Christenson TR, Mohney SE, Kelly TF. Fabrication of micromechanical devices from polysilicon films with smooth surfaces. In Micromechanics and MEMS: Classic and Seminal Papers to 1990. Wiley-IEEE Press. 1997. p. 532-537 https://doi.org/10.1109/9780470545263.sect10