Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

Guang Lu, Zhao Liang Cao, Zhen Wu Lu, Wei Li, Ji Min Yao, Gang Zhang, Bai Yang, Jia Cong Shen

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1 Scopus citations

Abstract

A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface-directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.

Original languageEnglish (US)
Number of pages1
JournalKao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities
Volume23
Issue number12
StatePublished - Dec 1 2002

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

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    Lu, G., Cao, Z. L., Lu, Z. W., Li, W., Yao, J. M., Zhang, G., Yang, B., & Shen, J. C. (2002). Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting. Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities, 23(12).