Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

Guang Lu, Zhao Liang Cao, Zhen Wu Lu, Wei Li, Ji Min Yao, Gang Zhang, Bai Yang, Jia Cong Shen

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface-directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.

Original languageEnglish (US)
Number of pages1
JournalKao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities
Volume23
Issue number12
StatePublished - Dec 1 2002

Fingerprint

Polymer films
Gold
Etching
Polymers
Ions
Fabrication
Argon
Substrates
Polymer solutions
Printing
Condensation

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

Cite this

Lu, Guang ; Cao, Zhao Liang ; Lu, Zhen Wu ; Li, Wei ; Yao, Ji Min ; Zhang, Gang ; Yang, Bai ; Shen, Jia Cong. / Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting. In: Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities. 2002 ; Vol. 23, No. 12.
@article{31298ed97f3c404089a2b08e563444df,
title = "Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting",
abstract = "A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface-directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.",
author = "Guang Lu and Cao, {Zhao Liang} and Lu, {Zhen Wu} and Wei Li and Yao, {Ji Min} and Gang Zhang and Bai Yang and Shen, {Jia Cong}",
year = "2002",
month = "12",
day = "1",
language = "English (US)",
volume = "23",
journal = "Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities",
issn = "0251-0790",
publisher = "Higher Education Press",
number = "12",

}

Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting. / Lu, Guang; Cao, Zhao Liang; Lu, Zhen Wu; Li, Wei; Yao, Ji Min; Zhang, Gang; Yang, Bai; Shen, Jia Cong.

In: Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities, Vol. 23, No. 12, 01.12.2002.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

AU - Lu, Guang

AU - Cao, Zhao Liang

AU - Lu, Zhen Wu

AU - Li, Wei

AU - Yao, Ji Min

AU - Zhang, Gang

AU - Yang, Bai

AU - Shen, Jia Cong

PY - 2002/12/1

Y1 - 2002/12/1

N2 - A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface-directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.

AB - A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface-directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.

UR - http://www.scopus.com/inward/record.url?scp=0347304603&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0347304603&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0347304603

VL - 23

JO - Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities

JF - Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities

SN - 0251-0790

IS - 12

ER -