A stencil mask method to fabricate metallic patch arrays on the electrostrictive poly(vinylidene flouride-trifluoroethylene) copolymer films was discussed. It was found that the metallic patterns were formed by evaporating metal through a stencil mask. The temperature at the substrate surface was estimated to be below 100° due to short deposition time and the long distance between the substrate and the evaporation source. The results show that the stencil flask method was useful for depositing metallic patterns on a subset of substrates.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)