Fabrication of thin-film cold cathodes by a modified chemical vapor deposition diamond process

B. L. Weiss, A. Badzian, L. Pilione, T. Badzian, W. Drawl

Research output: Contribution to journalArticle

12 Scopus citations

Abstract

Thin-film cold cathodes have been grown on molybdenum by a modified microwave assisted plasma chemical vapor deposition diamond process. Electron field-emission tests have been performed on the devices. The modification from the chemical vapor deposition diamond process includes the addition of N2 and O2 into the plasma during the growth stage. Characterization of these films indicates a disordered tetrahedral carbon structure. Raman spectroscopy shows a disturbance in the cubic symmetry of the lattice and x-ray diffraction indicates a disordered tetrahedral structure. Electron emission testing indicate low turn-on voltages. Current densities from 1 to 8 mA/cm2 can be obtained for applied fields of 5-8 V/μm. The results are explained in terms of a change in the electronic band structure and the formation of states in the band gap.

Original languageEnglish (US)
Pages (from-to)681-683
Number of pages3
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume16
Issue number2
Publication statusPublished - Mar 1 1998

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this