Facile non-lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene-block-polydimethylsiloxane films

Zhe Qiang, Maurice L. Wadley, Bryan Vogt, Kevin A. Cavicchi

Research output: Contribution to journalArticle

7 Scopus citations

Abstract

Thin films (monolayer and bilayer) of cylinder forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) were shear aligned by the swelling and deswelling of a crosslinked PDMS pad that was physically adhered to the film during solvent vapor annealing. The nanostructures formed by self-assembly were exposed to ultraviolet-ozone to partially oxidize the PDMS, followed by calcination in air at 500 °C. In this process, the PS segments were fully decomposed, while the PDMS yielded silica nanostructures. The highly aligned PDMS cylinders were thus deposited as silica nanolines on the silicon substrate. Using a bilayer film, the center-to-center distance of these features were effectively halved from 38 to 19 nm. Similarly, by sequential shear-alignment of two distinct layers, a rhombic array of silica nanolines was fabricated. This methodology provides a facile route to fabricating complex topographically patterned nanostructures.

Original languageEnglish (US)
Pages (from-to)1058-1064
Number of pages7
JournalJournal of Polymer Science, Part B: Polymer Physics
Volume53
Issue number15
DOIs
StatePublished - Aug 1 2015

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Physical and Theoretical Chemistry
  • Polymers and Plastics
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Facile non-lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene-block-polydimethylsiloxane films'. Together they form a unique fingerprint.

  • Cite this