Fatigue insensitivity of nanoscale freestanding aluminum films

Sandeep Kumar, Md Tarekul Alam, M. A. Haque

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

We demonstrate a microelectromechanical-system-based setup for fatigue studies on 200-nm-thick freestanding aluminum specimens in situ inside the transmission electron microscope. The specimens did not show any sign of fatigue damage even at 1.2 × 10-6cycles under nominal stresses about 80% of the static ultimate strength. We show direct evidence to propose that the conventional theory of fatigue crack nucleation through slip bands does not work for nanoscale freestanding thin films, which gives rise to the anomalous fatigue insensitivity.

Original languageEnglish (US)
Article number5685789
Pages (from-to)53-58
Number of pages6
JournalJournal of Microelectromechanical Systems
Volume20
Issue number1
DOIs
StatePublished - Feb 2011

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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