Formation of silicon nanodots via ion beam sputtering of ultrathin gold thin film coatings on Si

Osman El-Atwani, Sami Ortoleva, Alex Cimaroli, Jean Paul Allain

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

Ion beam sputtering of ultrathin film Au coatings used as a physical catalyst for self-organization of Si nanostructures has been achieved by tuning the incident particle energy. This approach holds promise as a scalable nanomanufacturing parallel processing alternative to candidate nanolithography techniques. Structures of 11- to 14-nm Si nanodots are formed with normal incidence low-energy Ar ions of 200 eV and fluences above 2 × 10 17 cm -2. In situ surface characterization during ion irradiation elucidates early stage ion mixing migration mechanism for nanodot self-organization. In particular, the evolution from gold film islands to the formation of ion-induced metastable gold silicide followed by pure Si nanodots formed with no need for impurity seeding.

Original languageEnglish (US)
Article number403
Pages (from-to)1-5
Number of pages5
JournalNanoscale Research Letters
Volume6
DOIs
StatePublished - 2011

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics

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