Formation of ultra-thin quantum dot films by mist deposition

S. C. Price, K. Shanmugasundaram, T. Zhu, F. Zhang, Jian Xu, Suzanne E. Mohney, Q. Zhang, Jerzy Ruzyllo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Films of CdSe colloidal semiconductor quantum dots were deposited on several substrates including bare silicon, silicon dioxide, aluminum, and ITO coated glass using mist deposition. The process parameters, including deposition time, solution concentration, and electric field, were varied to change the thickness of the deposited film. Blanket films and films deposited through a shadow mask were created to investigate the method's ability to pattern films during the deposition process. Smooth films were formed with thicknesses from about 39 nm, or 7 monolayers, to a single layer. The results show that mist deposition of quantum dots is a viable method for creating thin quantum dot films.

Original languageEnglish (US)
Title of host publicationECS Transactions - Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD
Pages89-94
Number of pages6
Edition8
DOIs
StatePublished - Dec 1 2007
Event1st Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD - 212th ECS Meeting - Washington, DC, United States
Duration: Oct 7 2007Oct 12 2007

Publication series

NameECS Transactions
Number8
Volume11
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other1st Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD - 212th ECS Meeting
CountryUnited States
CityWashington, DC
Period10/7/0710/12/07

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All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Price, S. C., Shanmugasundaram, K., Zhu, T., Zhang, F., Xu, J., Mohney, S. E., Zhang, Q., & Ruzyllo, J. (2007). Formation of ultra-thin quantum dot films by mist deposition. In ECS Transactions - Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD (8 ed., pp. 89-94). (ECS Transactions; Vol. 11, No. 8). https://doi.org/10.1149/1.2783306